Resin composition for optical material, resin film for optical material and optical waveguide using same

ABSTRACT

Disclosed is a resin composition for an optical material which contains a base polymer (A), a photopolymerizable compound (B), and a photopolymerization initiator (C). Also disclosed is a resin film for an optical material which is made of such a resin composition for an optical material. Specifically disclosed is a resin composition for an optical material which has high transparency and high heat resistance, while enabling formation of a thick film with high precision. This resin composition is particularly useful for a resin film which is used for forming optical waveguides. Also specifically disclosed are a resin film for an optical material using such a resin composition and an optical waveguide using such a resin film.

TECHNICAL FIELD

The present invention relates to a resin composition for an opticalmaterial having excellent heat resistance, transparency, andproductivity, a resin film for an optical material, and an opticalwaveguide using the film as well as to a flexible optical waveguidehaving excellent flexibility, toughness, and productivity and to amethod of producing the same.

BACKGROUND ART

To cope with an increase in volume of information concomitant withpopularization of the Internet and Local Area Network (LAN), opticalinterconnection technology that uses optical signals is being underdevelopment not only in communication fields of main line and accesstype but also in short distance signal transmission between boards orinboards of routers and server devices. Specifically, to enable use oflight in short distance signal transmission between boards or in boardsin routers and server devices, optical/electronic boards that include anelectric printed wiring board and an optical transmission path are underdevelopment.

In this case, it is desirable to use as the optical transmission path anoptical waveguide that has a higher degree of freedom in wiring and iscapable of being provided in higher density than optical fibers. Amongothers, optical waveguides made of polymer materials, which areexcellent in processability and cost performance, show promise. Polymeroptical waveguides have a structure that is adapted to coexist withelectric printed wiring boards as mentioned above, they are required tohave high heat resistance in addition to high transparency (lowtransmission loss). As materials for such an optical waveguide,fluorinated polyimides (see, for example, Patent Document 1 andNon-patent Document 1), deuterized silicone resins (see, for example,Non-patent Document 2), and epoxy resins (see, for example, PatentDocument 2 and Non-patent Document 3) have been proposed.

On the other hand, the optical waveguides for use in the above-mentionedutility are required to have a core size of generally 50 μm square toensure tolerance of connection with a light receiving or emittingdevice. This means that the core layer must have a thickness of about 50μm. However, when materials for waveguides including, for example,deuterized silicone resins or fluorinated polyimides are used, therearises a problem in that it is difficult to realize a thickness of about50 μm on an optical/electronic board or, if it is possible to realize,precision of film thickness will be poor because the materials forwaveguides are generally include solvents having low viscositiesalthough the resins themselves have high heat resistance to endure about300° C.

Further, when fluorinated polyimide waveguide materials, whichthemselves have high heat resistance to endure about 300° C. and hightransparency as high as 0.3 dB/cm at a wavelength of 850 nm, are used,film formation on an electric printed wiring board was difficult to beperformed since film formation requires heating at 300° C. or more forseveral tens minutes to several hours. Further, fluorinated polyimideshave no photosensitivity, so the method of fabricating opticalwaveguides by exposure to light and development can not be appliedthereto, and they thus have poor productivity and poor applicability tolarge-area fabrication. Further, since optical waveguides are fabricatedby a film forming method that involves applying a liquid material on asubstrate, management of film thickness is cumbersome and in addition,the resin applied on the substrate is still liquid before curing, so theresin will flow on the substrate to make it difficult to maintainuniformity of film thickness. Thus, there are many problems arising fromthe fact that the form of the material is liquid.

Further, the upper cladding after the core has been embedded must haveflatness taking into consideration of subsequent mounting of lightreceiving or emitting devices. However, when liquid waveguide materialsare used for the upper cladding, there tends to occur unevenness as aresult of following up the ridge pattern of the core, so it is difficultto realize flatness.

The epoxy resins have problems similar to those of the above-mentionedwaveguide materials including deuterized silicone resins or fluorinatedpolyimides because the epoxy resins are liquid.

That is, heretofore, epoxy resins for forming optical waveguides arethose epoxy resins that are liquid at room temperature, or solid epoxyresins diluted with solvents have been used. These epoxy resins haveexcellent transparency and heat resistance at about 200 to 280° C.However, since an epoxy resin is used for fabricating optical waveguidesby applying a liquid material on a substrate and forming a film by, forexample, a spin coating method, management of film thickness iscumbersome and in addition, the resin applied on the substrate is stillliquid before curing, so the resin will flow on the substrate to make itdifficult to maintain uniformity of film thickness. Thus, there are manyproblems arising from the fact that the form of the material is liquid.

Further, the epoxy resin is capable of forming core patterns by anexposure to light and development method by addition of an opticalpolymerization initiator and is reported to have a high transparency of0.1 dB/cm. However, the epoxy resins generally have heat resistance of200 to 280° C. and to obtain high reliability, they are required to havestill higher heat resistance although some of them are applicable to theabove-mentioned optical/electronic board.

As mentioned above, none of the conventional resins for forming opticalwaveguides has in combination (1) high transparency, (2) high heatresistance, (3) high-precision film formability, and (4) acceptableproductivity.

Further, in high speed, high-density signal transmission, betweenelectronic devices or printed wiring boards, transmission through theconventional electric wiring is approaching to a limit of attaining highspeed and high density due to restrictions of mutual interference andattenuation of signals. To break through such restrictions, thetechnology of connecting electronic devices and printed wiring boards toeach other by means of light, so-called optical interconnection is beingstudied. As the light path, flexible optical waveguides havingflexibility are considered to be suitable from the viewpoints of ease ofconnection to devices and substrates and ease of handling.

Flexible optical waveguides include polymer film optical waveguidesdescribed in, for example, Patent Document 3. Polymer films are formedas follows. A solution of a polymer or the like is applied on asubstrate such as silicon by spin coating and is baked to form a lowercladding layer. In the same manner, a core layer is formed and then amask pattern is formed with, for example, a Si-containing photoresistand dry-etched to form a core pattern. After that, an upper claddinglayer is formed in the same manner as that in which the lower claddinglayer is formed. Finally, the resultant optical waveguide is peeled fromthe substrate to fabricate a film-made optical waveguide. In particular,to make it easy to peel the optical waveguide, there is shown a methodin which a thermally oxidized silicon substrate is used as the substrateand after the formation of the optical waveguide, the substrate havingthe optical waveguide thereon is immersed in hydrofluoric acid toseparate the optical waveguide.

However, in the case of the above-mentioned film optical waveguide, eachof the lower cladding, core, and upper cladding layers is formed by spincoating and baking. This method takes much time for forming each layerand in addition has problems arising from the fact that the form of thematerial is liquid. That is, since optical waveguides are fabricated bya film forming method that involves applying a liquid material on asubstrate, management of film thickness is cumbersome and in addition,the resin applied on the substrate is still liquid before curing, so theresin will flow on the substrate to make it difficult to maintainuniformity of film thickness. Also, the method is not suitable for massproduction of optical waveguides having a size of 10 cm or more becauseof use of silicon for substrates.

Further, the above-mentioned production method involves a step of dryetching, which is a high vacuum process, so dry etching must beperformed for a very long period of time to fabricate multi-mode opticalwaveguides having a thick core layer.

Patent Document 1: Japanese Patent No. 3085666

Patent Document 2: Japanese Patent Application Laid-Open No. 6-228274

Patent Document 3: Japanese Patent Application Laid-Open No. 7-239422

Non-patent Document 1: Journal of Japan Institute of ElectronicsPackaging, Vol. 7, No. 3, pp. 213-218, 2004

Non-patent Document 2: IEEE Journal of Lightwave Technology, Vol. 16,pp. 1049-1055, 1998

Non-patent Document 3: Optics (“Kogaku”), vol. 3, No. 2, pp. 81-83, 2002

DISCLOSURE OF THE INVENTION

In view of the above-mentioned problems, it is an object of the presentinvention to provide a resin composition for an optical material thatallows formation of a thick film having high transparency, high heatresistance, and high precision and has high productivity and that isparticularly useful for resin films for forming optical waveguides, aresin film for an optical material using such a resin composition, andan optical waveguide using such a film. It is another object of thepresent invention to provide a flexible optical waveguide having highflexibility and toughness and in addition having excellent productivityand a method of producing the same.

The inventors of the present invention have made extensive studies andas a result, they have found that the above-mentioned objects can beachieved by using specified photopolymerizable compounds and by using aresin composition containing a base polymer, a photopolymerizablecompound, and a polymerization initiator.

That is, the present invention relates to the following.

(1) A resin composition for an optical material, including:

(A) a base polymer;

(B) a photopolymerizable compound; and

(C) a photopolymerization initiator.

(2) A resin composition for an optical material, including:

(B) a photopolymerizable compound that is fluorene di(meth)acrylaterepresented by the following general formula (I); and

(C) a photopolymerization initiator,

wherein X is represented by the following formula (II); Y is hydrogen ora methyl group; and m and n are each an integer of 1 to 20;

wherein R1 to R16 independently represent hydrogen, an alkyl grouphaving 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms,an alkoxycarbonyl group having 2 to 7 total carbon atoms, an aryl grouphaving 6 to 10 carbon atoms, or an aralkyl group having 7 to 9 carbonatoms.

(3) A resin composition for an optical material according to Item (1),in which the photopolymerizable compound (B) has an ethylenicallyunsaturated group in a molecule thereof.

(4) A resin composition for an optical material according to Item (3),in which the photopolymerizable compound (B) is epoxy(meth)acrylate oracryl(meth)acrylate.

(5) A resin composition for an optical material according to Item (3),in which the component (B) contains fluorene di(meth)acrylaterepresented by the following general formula (I):

wherein X is represented by the following formula (II); Y is hydrogen ora methyl group; and m and n are each an integer of 1 to 20;

wherein R1 to R16 independently represent hydrogen, an alkyl grouphaving 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms,an alkoxycarbonyl group having 2 to 7 carbon atoms, an aryl group having6 to 10 carbon atoms, or an aralkyl group having 7 to 9 carbon atoms.

(6) A resin composition for an optical material according to Item (3),wherein the component (B) contains (meth)acrylate represented by thefollowing general formula (III):

wherein R¹⁷ is —CH₂CH(OH)CH₂—, —(C₂H₄O)_(h)C₂H₄—, —(C₃H₆O)_(i)C₃H₆—, or—(C₂H₄O)_(j)—(C₃H₆O)_(k)C₃H₆—; U is —C(CH₃)₂—, —CH₂—, —SO₂—, or —O—; Vis hydrogen or halogen; and W is hydrogen or —CH₃, provided that h, i,j, and k are each an integer of 0 to 10.

(7) A resin composition for an optical material according to Item (1),wherein the resin composition contains as the component (B) a compoundhaving 2 or more epoxy groups in a molecule thereof.

(8) A resin composition for an optical material according to any one ofItems (1) and (3) to (7), wherein the base polymer (A) has a numberaverage molecular weight of 5,000 or more.

(9) A resin composition for an optical material according to any one ofItems (1) and (3) to (8), wherein the base polymer (A) has an aromaticskeleton in a main chain thereof.

(10) A resin composition for an optical material according to Item (9),wherein the base polymer (A) includes as structural units of thecopolymer components:

(a-1) at least one member selected from the group consisting ofbisphenol A, a bisphenol A type epoxy compound, and derivatives thereof;and

(a-2) at least one member selected from the group consisting ofbisphenol F, a bisphenol F type epoxy compound, and derivatives thereof.

(11) A resin composition for an optical material according to Item (9),wherein the base polymer (A) includes a phenoxy resin.

(12) A resin composition for an optical material according to any one ofItems (1) and (3) to (8), wherein the base polymer (A) includes an epoxyresin that is solid at room temperature.

(13) A resin composition for an optical material according to any one ofItems (1) and (3) to (12), wherein:

the content of the component (A) is 5 to 80 mass % and the content ofthe component (B) is 20 to 95 mass % with respect to a total content ofthe components (A) and (B); and

the content of the component (C) is 0.1 to 10 mass parts with respect to100 mass parts of the components (A) and (B) in total.

(14) A resin composition for an optical material according to Item (13),wherein the content of the component (A) is 10 to 80 mass % and thecontent of the component (B) is 20 to 90 mass % with respect to a totalcontent of the components (A) and (B).

(15) A resin composition for an optical material according to any one ofItems (1) to (14), wherein the content of the component (B) is 90 to99.9 mass % and the content of the component (C) is 0.1 to 10 mass %with respect to a total mass of the components (B) and (C).

(16) A resin film for an optical material, including the resincomposition according to any one of Items (1) and (3) to (15).

(17) A resin film for an optical material according to Item (16),wherein the resin film for an optical material is a resin film forforming optical waveguides, and a cured product of the film has anoptical transmission loss of 0.5 dB/cm or less.

(18) An optical waveguide, including the resin film for an opticalmaterial according to Item (17) as at least one of a lower cladding, acore, and an upper cladding of the optical waveguide.

(19) A method of fabricating an optical waveguide, including:

a first step of laminating a resin film for an optical material on asubstrate to form a lower cladding layer;

a second step of laminating a resin film for an optical material havinga refractive index higher than that of the lower cladding layer on thelower cladding layer to form a core layer;

a third step of exposing the core layer to light to develop the corelayer to form a core pattern of an optical waveguide; and

a fourth step of laminating a resin film for an optical material havinga refractive index lower than that of the core layer to form an uppercladding layer,

wherein at least one of the resin films for optical materials used inthe first step, the second step, and the fourth step is the resin filmfor an optical material according to Item (16) or (17).

(20) A flexible optical waveguide, including one resin film for forminga core layer and two resin films for forming a cladding layer, whereinat least one of the resin films for forming a cladding layer is composedof a resin for forming a cladding layer and a base material film, andthe base material film is arranged on an outer side of the claddinglayer with respect to the core layer.

(21) A flexible optical waveguide according to Item (20), wherein theresin films for forming a cladding layer each include a base materialfilm subjected to adhesion treatment and a film of the resin for forminga cladding layer formed on the base material film.

(22) A flexible optical waveguide according to Item (20) or (21),wherein at least one of the resin film for forming a core layer and thetwo resin films for forming a cladding layer is the resin film for anoptical material according to Item (17).

(23) A method of fabricating a flexible optical waveguide, including:

a first step of curing a cladding layer in a resin film for forming acladding layer composed of the resin for forming a cladding layer and abase material film to form a cladding layer;

a second step of laminating a resin film for forming a core layer on thecladding layer to laminate a core layer;

a third step of exposing the core layer to light to develop to form acore pattern of an optical waveguide; and

a fourth step of laminating a resin film for forming a cladding layer onthe core pattern and curing the resin for forming a cladding layer.

(24) A method of fabricating a flexible optical waveguide according toItem (23), wherein the resin film for forming a cladding layer includesa base material film subjected to adhesion treatment and a film of theresin for forming a cladding layer formed on the base material film.

(25) A method of fabricating an optical waveguide according to Item (23)or (24), wherein at least one of the resin film for forming a core layerand the two resin films for forming a cladding layer is the resin filmfor an optical material according to Item (17).

The resin composition for an optical material of the present inventionhas high transparency and high heat resistance. The resin film for anoptical material including the composition has high transparency andhigh heat resistance and allows for high-precision formation of a thickfilm. Further, use of the resin film for an optical material enablesproduction of optical waveguides having excellent performance with highproductivity.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic diagram illustrating the process of forming anoptical waveguide pattern.

FIG. 2 is a diagram illustrating the method of producing a flexibleoptical waveguide.

DESCRIPTION OF SYMBOLS

-   1; lower cladding layer-   2; substrate-   3; core layer-   4; base material (for forming a core layer)-   5; photo mask-   6; core pattern-   7; upper cladding layer-   8; base material film (for forming a cladding layer)-   9; lower cladding layer-   10; core layer-   11; base material (for forming a core layer)-   12; photo mask-   13; core pattern-   14; upper cladding layer-   15; base material film (for forming a cladding layer)

BEST MODE FOR CARRYING OUT THE INVENTION

The resin composition for an optical material of the present inventionis a resin composition that includes (A) a base polymer, (B) aphotopolymerizable compound, and (C) a photopolymerization initiator.Alternatively, the resin composition for an optical material of thepresent invention is a resin composition that includes a fluorenedi(meth)acrylate as the photopolymerizable compound (B) and thephotopolymerization initiator (C).

The base polymer (A) as used herein is to ensure strength of a curedproduct such as a film when such a cured product is formed and is notparticularly limited as far as it can achieve such an object. Examplesof the base polymer (A) include phenoxy resins, epoxy resins,(meth)acrylic resins, polycarbonate resins, polyallylate resins,polyether amides, polyether imides, polyether sulfones, and derivativesthereof. The base polymers may be used singly or two or more of them maybe used as admixtures.

Among the base polymers exemplified as mentioned above, those havingaromatic skeleton in the main chain are preferable, in particular,phenoxy resins are preferable, from the viewpoint of high heatresistance. Further, from the view point of being capable of beingthree-dimensionally cross-linked to increase heat resistance, epoxyresins, in particular, epoxy resins that are solid at room temperatureare preferable.

Further, when the resin composition of the present invention is used toform films, it is important to ensure transparency of the film. For thispurpose, the base polymer must have high compatibility with thephotopolymerizable compound (B) described in detail hereinbelow. Fromthis point of view, the above-mentioned phenoxy resins and (meth)acrylic resins are preferable. Note that the (meth)acrylic resin as usedherein refers to acrylic resins and methacrylic resins.

The phenoxy resin is an amorphous polymer and generally represented bythe following general formula (IV).

Here, n is an integer of 1 or more; m is 0 or 1; and —R₀— is a grouprepresented by the following general formula (V), (VI), or (VII), or—O—.

Here, R₁ to R₁₀ are independently H, or an organic group represented byCH₃, CF₃, or the like.

Among the above-mentioned phenoxy resins, a straight chain polymer of abisphenol A type epoxy resin having a repeating unit represented by thefollowing formula (VIII) has high heat resistance and hence ispreferable.

The phenoxy resin of the above-mentioned straight chain polymergenerally is prepared by a one-step method in which bisphenol A andepichlorohydrin are subjected to polycondensation reaction or a two-stepmethod in which a low molecular epoxy resin and bisphenol A aresubjected to polyaddition reaction. Specific examples of the phenoxyresin include “YP-50” (trade name) manufactured by Tohto Kasei Co.,Ltd., and those described in Japanese Patent Application Laid-Open No.4-120124, Japanese Patent Application Laid-Open No. 4-122714, andJapanese Patent Application Laid-Open No. 4-339852.

Further, in addition to the phenoxy resins represented by theabove-mentioned general formula (IV), polymers obtained by polyadditionreaction between various bifunctional epoxy resins and bisphenols, forexample, brominated phenoxy resins (Japanese Patent ApplicationLaid-Open No. 63-191826, JP-B-8-26119), bisphenol A/bisphenol Fcopolymer type phenoxy resins (Japanese Patent No. 2917884, JapanesePatent No. 2799401), phosphorus-containing phenoxy resins (JapanesePatent Application Laid-Open No. 2001-310939), high heat-resistancephenoxy resins having introduced therein a fluorene skeleton (JapanesePatent Application Laid-Open No. 11-269264, Japanese Patent ApplicationLaid-Open No. 11-302373), and so on are known as phenoxy resins.

The phenoxy resins mentioned below represented by the above-mentionedbisphenol A/bisphenol F copolymer type phenoxy resins are suitable asthe component (A) of the present invention. That is, the phenoxy resincontains as structural units of the copolymer components (a-1) at leastone member selected from the group consisting of bisphenol A, abisphenol A type epoxy compound, and derivatives thereof, and (a-2) atleast one member selected from the group consisting of bisphenol F, abisphenol F type epoxy compound, and derivatives thereof.

The resin film for an optical material made of a resin composition thatincludes a resin having the components (a-1) and (a-2) as thecopolymerizable components is particularly suitable as a resin film forforming an optical waveguide. Use of it can increase interlayer adhesionof a cladding and a core and pattern formability (thin line or narrowspace responsiveness) at the time of formation of the core pattern of anoptical waveguide so that fine pattern formation having small line andspace is possible.

Suitable examples of the bisphenol A or a bisphenol A type epoxycompound or derivatives thereof include tetrabromobisphenol A and atetrabromobisphenol A type epoxy compound. Further, suitable examples ofthe bisphenol F or a bisphenol F type epoxy compound and derivativesthereof include tetrabromobisphenol F and a tetrabromobisphenol F typeepoxy compound.

The base polymer (A) of the present invention includes particularlypreferably a bisphenol A/bisphenol F copolymer type phenoxy resin asmentioned above, which is available, for example, as “Phenototo YP-70”(trade name) manufactured by Tohto Kasei Co., Ltd.

Then, the epoxy resin that is solid at room temperature includesbisphenol A type epoxy resins, for example, “Epototo YD-7020, EpototoYD-7019, Epototo YD-7017” (trade names) manufactured by Tohto Kasei Co.,Ltd. and “Epikote 1010, Epikote 1009, Epikote 1008” (trade names)manufactured by Japan Epoxy Resins Co., Ltd.

The molecular weight of the base polymer (A) is preferably 5,000 ormore, more preferably 10,000 or more, and particularly preferably 30,000or more in terms of number average molecular weight in order to make itpossible to form even a thick film of about 50 μm as required foroptical waveguides for optical signal transmission between boards or ina board in routers or server devices. There is no particular upper limitof the molecular weight but from the viewpoints of compatibility withthe photopolymerizable compound (B) or the exposure to light anddevelopability, the molecular weight of the base polymer is preferably1,000,000 or less, more preferably 500,000 or less, and particularlypreferably 200,000 or less. Note that the number average molecularweight in the present invention is a value determined by measurement bygel permeation chromatography (GPC) and calculation in terms of standardpolystyrene.

The blending amount of the base polymer (A) is preferably 5 to 80 mass %with respect to the total mass of the components (A) and (B). When theblending amount of the base polymer (A) is 5 mass % or more, it is easyto form films of the resin composition that contains thephotopolymerizable compound and photopolymerization initiator. Inparticular, the blending amount of 10 mass % or more is preferable sinceeven a thick film having a film thickness of 50 μm or more can bereadily prepared upon film formation.

On the other hand, when the component (A) is in an amount of 80 mass %or less, the pattern formability of the resin composition increases andphotocuring reaction proceeds sufficiently upon formation of opticalwaveguides. From these viewpoints, the blending amount of the basepolymer (A) is set to more preferably 20 to 70 mass %.

Then, the photopolymerizable compound (B) in the present invention isnot particularly limited as far as it can polymerize by irradiation oflight such as ultraviolet ray. However, from the reactivity with light,it is preferable that the photopolymerizable compound (B) be a compoundthat has an ethylenically unsaturated group in the molecule. Specificexamples thereof include (meth)acrylates, vinylidene halides, vinylether, vinylpyridine, and vinylphenol. Among these, (meth)acrylates arepreferable from the viewpoints of transparency and heat resistance.

(Meth)acrylates may be any of monofunctional, bifunctional, andtrifunctional ones.

Note that “(meth)acrylate” as used herein refers to acrylates andmethacrylates.

Examples of the monofunctional (meth)acrylate includemethoxypolyethylene glycol(meth)acrylate, phenoxypolyethyleneglycol(meth)acrylate, lauryl(meth)acrylate, isostearyl(meth)acrylate,2-(meth)acryloyloxyethyl succinate, paracumylphenoxyethyleneglycol(meth)acrylate, 2-tetrahydropyranyl(meth)acrylate,isobornyl(meth)acrylate, methyl(meth)acrylate, ethyl(meth)acrylate,butyl(meth)acrylate, and benzyl(meth)acrylate.

Further, examples of the bifunctional (meth)acrylates includeethoxylated 2-methyl-1,3-propanediol di(meth)acrylate, neopentyl glycoldi(meth)acrylate, 1,6-hexanediol di(meth)acrylate,2-methyl-1,8-octanediol di(meth)acrylate, 1,9-nonanedioldi(meth)acrylate, 1,10-nonanediol di(meth)acrylate, ethoxylatedpolypropylene glycol di(meth)acrylate, propoxylated ethoxylatedbisphenol A diacrylate, ethylene glycol di(meth)acrylate, triethyleneglycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate,polyethylene glycol di(meth)acrylate, polypropylene glycoldi(meth)acrylate, ethoxylated bisphenol A di(meth)acrylate,tricyclodecane di(meth)acrylate, ethoxylated cyclohexane dimethanoldi(meth)acrylate, 2-hydroxy-1-acryloxy-3-methacryloxypropane,2-hydroxy-1,3-dimethacryloxypropane,9,9-bis[4-[(2-acryloyloxyethoxy)phenyl]fluorene,9,9-bis(3-phenyl-4-acryloylpolyoxyethoxy)fluorene, bisphenol A type,phenol novolak type, cresol novolak type, and glycidyl ether typeepoxy(meth)acrylates.

Further, examples of the trifunctional or higher functional(meth)acrylates include ethoxylated isocyanuric acid tri(meth)acrylate,ethoxylated glycerol tri(meth)acrylate, trimethylolpropanetri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate,pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate,ethoxylated pentaerythritol tetra(meth)acrylate, propoxylatedpentaerythritol tetra(meth)acrylate, ditrimethylolpropanetetra(meth)acrylate, caprolactone-modified ditrimethylolpropanetetra(meth)acrylate, and dipentaerythritol hexa(meth)acrylate. These maybe used singly or two or more of them may be used in combination.

As the photopolymerizable compound (B), a single compound may be usedalone or two or more compounds may be used in admixture. When theabove-mentioned bifunctional or higher functional (meth)acrylates areused, the base polymer can be cured by being entangled in thethree-dimensional network structure resulting by the polymerization, soit is preferable that at least one bifunctional or higher functionalpolymerizable compound be used as the component (B).

Among the above-mentioned examples of the component (B), epoxy(meth)acrylate is a compound that is suitable for obtaining bothtransparency and heat resistance simultaneously and it is preferablethat this compound be used in the present invention. Representativeexamples of epoxy(meth)acrylates include bisphenol A epoxyacrylaterepresented by the following formula (IX). Bisphenol A epoxyacrylate hasexcellent compatibility with a phenoxy resin and can realize hightransparency, so it is a very preferable embodiment to use a phenoxyresin as the component (A) and bisphenol A epoxyacrylate as thecomponent (B).

Note that bisphenol A epoxyacrylate is commercially available as EA-1020(trade name, manufactured by Shin-Nakamura Chemical Co., Ltd.).

Further, from the viewpoint of transparency, it is preferable to useacryl(meth)acrylate as the component (B). In particular, when a(meth)acrylic resin as the component (A) is combined therewith, theeffect is markedly high. Acryl (meth)acrylate is not particularlylimited and generally, it is a product of addition of a monofunctional(meth)acrylate to a polymer of glycidyl acrylate. Examples of themonofunctional (meth)acrylate include various ones, and for example,(meth)acrylic acid and compounds similar to those exemplified above asthe monofunctional (meth)acrylate can be used.

When optical waveguides are formed using as a resin film for formingoptical waveguides the resin film for an optical material made of theresin composition for an optical material of the present invention, acore film having a high refractive index and a cladding film having alow refractive index are required as described in detail hereinbelow.When the resin film for an optical material of the present invention isused as a core film, the photopolymerizable compound as the component(B) preferably contains fluorene di(meth)acrylate as a constituenttaking into consideration high refractive index in addition to hightransparency, high heat resistance, compatibility with the component(A). In particular, it is preferable that the photopolymerizablecompound as the component (B) contain fluorene di(meth)acrylaterepresented by the following general formula (I) as a constituent.

Here, X is represented by the following formula (II); Y is hydrogen or amethyl group; and m and n are each an integer of 1 to 20, preferably aninteger of 1 to 10.

Here, R1 to R16 independently represent hydrogen, an alkyl group having1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, analkoxycarbonyl group having 2 to 7 carbon atoms, an aryl group having 6to 10 carbon atoms, or an aralkyl group having 7 to 9 carbon atoms. R9to R16 each may be present at any position of the benzene rings and, atportions where these substituents are absent (“*” marks in the formula(II)), the benzene rings are connected to oxygen in the skeleton of theformula (I). Note that those compounds of the general formulae (I) and(II) in which Y is hydrogen, R1 to R16 are each hydrogen, m is 1, and nis 1 are commercially available (trade name “A-BPEF”, manufactured byShin-Nakamura Chemical Co., Ltd.).

In addition, from similar viewpoints, (meth)acrylate represented by thefollowing general formula (III) may be used as the film of a corematerial.

Here, R¹⁷ is or —CH₂CH(OH)CH₂—, —(C₂H₄O)_(h)C₂H₄—, —(C₃H₆O)_(i)C₃H₆—, or—(C₂H₄O)_(j)—(C₃H₆₀)_(k)C₃H₆—, U is —C(CH₃)₂—, —CH₂—, —SO₂—, or —O—, Vis hydrogen or halogen, W is hydrogen or —CH₃. Further, h, i, j, and kare each an integer of 0 to 10. Among these, bisphenol A typeepoxyacrylate in which R¹⁷ is —CH₂CH(OH)CH₂—, U is —C(CH₃)₂—, V ishydrogen, and W is hydrogen is particularly preferable. This compound iscommercially available (trade name “EA-1020”, manufactured byShin-Nakamura Chemical Co., Ltd.).

Note that, the above-mentioned fluorene di(meth)acrylate and a compoundhaving at least one (meth) acryloyl group in the molecule can be used incombination as the component (B).

It is preferable that the photopolymerizable compound (B) in the presentinvention contain a compound having two or more epoxy groups in themolecule. Specific examples thereof include: bifunctional aromaticglycidyl ethers such as a bisphenol A type epoxy resin, atetrabromobisphenol A type epoxy resin, a bisphenol F type epoxy resin,a bisphenol AD type epoxy resin, and a naphthalene type epoxy resin;polyfunctional aromatic glycidyl ethers such as a phenol novolak typeepoxy resin, a cresol novolak type epoxy resin, adicyclopentadiene-phenol type epoxy resin, and a tetraphenylolethanetype epoxy resin; bifunctional aliphatic glycidyl ethers such as apolyethylene glycol type epoxy resin, a polypropylene glycol type epoxyresin, a neopentyl glycol type epoxy resin, and a hexanediol type epoxyresin; bifunctional alicyclic glycidyl ethers such as a hydrogenatedbisphenol A type epoxy resin; polyfunctional aliphatic glycidyl etherssuch as a trimethylolpropane type epoxy resin, a sorbitol type epoxyresin, and a glycerol type epoxy resin; bifunctional aromatic glycidylesters such as diglycidyl phthalate; bifunctional alicyclic glycidylesters such as diglycidyl tetrahydrophthalate and diglycidylhexahydrophthalate; bifunctional aromatic glycidylamines such asN,N-diglycidylaniline and N,N-diglycidyltrifluoromethylaniline;polyfunctional aromatic glycidylamines such asN,N,N′,N′-tetraglycidyl-4,4-diaminodiphenylmethane,1,3-bis(N,N-glycidylaminomethyl)cyclohexane, andN,N,O-triglycidyl-p-aminophenol; bifunctional alicyclic epoxy resinssuch as alicyclic diepoxy acetal, alicyclic diepoxy adipate, alicyclicdiepoxy carboxylate, and vinyl cyclohexene dioxide; bifunctionalheterocyclic epoxy resins such as diglycidyl hydantoin; polyfunctionalheterocyclic epoxy resins such as triglycidyl isocyanurate; andbifunctional or polyfunctional silicon-containing epoxy resins such asan organopolysiloxane type epoxy resin.

The compounds each having two or more epoxy groups in the moleculeusually have a molecular weight on the order of 100 to 2,000, morepreferably 150 to 1,000 and those which are liquid at room temperatureare preferably used. These compounds may be used singly or two or moreof them may be used in combination. Further, they can be used incombination with other photopolymerizable compounds. Note that themolecular weight of the photopolymerizable compound in the presentinvention can be measured by a GPC method or a mass spectrometricmethod.

The blending amount of the photopolymerizable compound (B) is preferably20 to 95 mass % with respect to the total mass of the components (A) and(B). When the blending amount of the photopolymerizable compound (B) is20 mass % or more, it is easy to cure the resin composition with thebase polymer being entangled by the photopolymerizable compound (B).This is advantageous when optical waveguides are formed since patternformability is increased. On the other hand, when the blending amount is95 mass % or less, it is easy to form films by addition of the component(A). Further, from the viewpoint of easy formation of thick films, theblending amount is preferably 90 mass % or less. From theabove-mentioned viewpoints, the blending amount of thephotopolymerizable compound (B) is more preferably 30 to 80 mass %.

The photopolymerization initiator (C) in the present invention is notparticularly limited. For example, initiators for fluorenedi(meth)acrylates and (meth)acrylates include: aromatic ketones such asbenzophenone, N,N′-tetramethyl-4,4′-diaminobenzophenone (Michler'sketone), N,N′-tetraethyl-4,4′-diaminobenzophenone,4-methoxy-4′-dimethylaminobenzophenone,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one,2,2-dimethoxy-1,2-diphenylethan-1-one, 1-hydroxycyclohexyl phenylketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one,1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, and1,2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one; quinonessuch as 2-ethylanthraquinone, phenanthrenequinone,2-tert-butylanthraquinone, octamethylanthraquinone,1,2-benzanthraquinone, 2,3-benzanthraquinone, 2-phenylanthraquinone,2,3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone,1,4-naphthoquinone, 9,10-phenanthraquinone, 2-methyl-1,4-naphthoquinone,and 2,3-dimethylanthraquinone; benzoin ether compounds such as benzoinmethyl ether, benzoin ethyl ether, and benzoin phenyl ether; benzoincompounds such as benzoin, methylbenzoin, and ethylbenzoin; benzylderivatives such as benzyl dimethyl ketal; 2,4,5-triarylimidazole dimerssuch as 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer,2-(o-chlorophenyl)-4,5-di(methoxyphenyl)imidazole dimer,2-(o-fluorophenyl)-4,5-diphenylimidazole dimer,2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer, and2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer; phosphine oxides suchas bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide,bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, and2,4,6-trimethylbenzoyldiphenylphosphine oxide; acridine derivatives suchas 9-phenylacridine and 1,7-bis(9,9′-acridinyl)heptane; N-phenylglycine;N-phenylglycine derivatives; and coumarine compounds. Further, in thecase of 2,4,5-triarylimidazole dimers, two 2,4,5-triarylimidazoles mayhave the same substituents on the aryl groups thereof to give asymmetric compound or may have different substituents on the aryl groupsto give an asymmetric compound. Like the combination ofdiethylthioxanthone and dimethylaminobenzoic acid, thioxanthonecompounds and tertiary amine compounds may be combined. These may beused singly or two or more of them may be used in combination.

Further, from the viewpoint of increasing transparency of the core layerand the cladding layer, aromatic ketones and phosphine oxides from amongthe above-mentioned compounds are preferable.

The initiator for the epoxy resin is not particularly limited andexamples thereof include: aryldiazonium salts such asp-methoxybenzenediazonium hexafluorophosphate; diaryliodonium salts suchas diphenyliodonium hexafluorophosphonium salt and diphenyliodoniumhexafluoroantimonate; triarylsulfonium salts such as triphenylsulfoniumhexafluorophosphonium salt, triphenylsulfonium hexafluoroantimonatesalt, diphenyl-4-thiophenoxyphenylsulfonium hexafluoroantimonate,diphenyl-4-thiophenoxyphenylsulfonium hexafluoroantimonate, anddiphenyl-4-thiophenoxyphenylsulfonium pentafluorohydroxyantimonate;triallylselenonium salts such as triphenylselenoniumhexafluorophosphonium salt, triphenylselenonium borofluoride, andtriphenylselenonium hexafluoroantimonate; dialkylphenazylsulfonium saltssuch as dimethylphenazylsulfonium hexafluoroantimonate anddiethylphenazylsulfonium hexafluoroantimonate;dialkyl-4-hydroxyphenylsulfonium salts such as4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and4-hydroxyphenylbenzylmethylsulfonium hexafluoroantimonate; and sulfonicacid esters such as α-hydroxymethylbenzoinsulfonates,N-hydroxyimidosulfonates, α-sulfonyloxyketone, and β-sulfonyloxyketone.These polymerization initiators may be used singly or two or more ofthem may be used in combination.

The blending amount of the photopolymerization initiator (C) ispreferably 0.1 to 10 mass parts with respect to 100 mass parts of thetotal amount of the components (A) and (B). When the blending amount is0.1 mass part or more, the photosensitivity of the resin composition issufficient while when the blending amount is 10 mass parts or less,absorption on the surface layer of the photosensitive resin compositionwill not increase upon exposure to light, so sufficient photocuringoccurs in the inside the resin composition. Further, when the resincomposition is used as an optical waveguide, the blending amount ispreferably within the above-mentioned range because transmission lossdoes not increase due to the influence of light absorption by thepolymerization initiator itself. From the above-mentioned viewpoints,the blending amount of the photopolymerization initiator (C) is morepreferably 0.2 to 5 mass parts.

Further, the content of the photopolymerization initiator (C) ispreferably in the range of 0.1 to 10 mass % with respect to the totalmass of the components (B) and (C). On the other hand, the content ofthe component (B) is in the range of preferably 90 to 99.9 mass %. Whenthe content of the component (C) is 0.1 mass % or more, thephotosensitivity of the resin composition is sufficient while when thecontent of the component (C) is 10 mass % or less, the surface of theoptical waveguide is selectively cured, so cure will not beinsufficient. Further, advantageously, transmission loss will notincrease because of the absorption by the polymerization initiatoritself. From the above-mentioned viewpoints, the content of thephotopolymerization initiator (C) is more preferably 0.2 to 5 mass %.

Further, in addition to this, so-called additives such as innerreleasing agents, antioxidants, yellowing preventing agents, ultravioletabsorbents, visible light absorbing agents, coloring agents,plasticizers, stabilizers, and fillers may be added to the resincomposition for an optical material of the present invention asnecessary, as far as the effects of the present invention are notadversely affected.

The resin film for an optical material of the present invention is madeof the above-mentioned resin composition and when the film is used as anoptical waveguide, it is preferable that the cured product of the resincomposition have optical transmission loss of 0.5 dB/cm or less. Here,the optical transmission loss is based on values measured by aprism-coupler type optical characteristics measuring apparatus(SPA-4000, manufactured by SAIRON TECHNOLOGY, Inc.).

The resin film for an optical material of the present invention can bereadily produced by dissolving the resin composition containing thecomponents (A) to (C) in a solvent, applying the resultant on asubstrate, and removing the solvent. The solvent used herein is notparticularly limited as far as it can dissolve the resin composition.For example, solvents such as acetone, methyl ethyl ketone, methylcellosolve, ethyl cellosolve, toluene, N,N-dimethylformamide,N,N-dimethylacetamide, and propylene glycol monomethyl ether and mixedsolvents thereof can be used. The solid concentration in the resinsolution is usually on the order of preferably 30 to 60 mass %.

The thickness of the resin film for an optical material of the presentinvention is not particularly limited and the thickness after drying isusually 10 μm to 100 μm. When the thickness of the film is 10 μm ormore, the connection tolerance with light receiving or emitting devicesor optical fibers can be advantageously expanded. On the other hand,when the thickness of the film is 100 μm or less, the connectionefficiency with the light receiving or emitting devices or opticalfibers can be advantageously increased. From the above-mentionedviewpoints, the thickness of the film is in the range of more preferably30 μm to 70 μm.

Further, the thickness of the film that serves as a cladding of anoptical waveguide is not particularly limited as far as it allowscontainment of light and embedding of the core. Usually, the thicknessof the film is 20 to 200 μm.

Hereinafter, an application example in which the resin film for anoptical material of the present invention is used as a resin film forforming an optical waveguide, which is the most preferable application,will be described in detail.

The base material used in the process of manufacturing the resin filmfor forming optical waveguides of the present invention is a support forsupporting a film for forming optical waveguides, the material of whichis not particularly limited. From the viewpoints of easy peeling of thefilm for forming optical waveguides and heat resistance and solventresistance, polyesters such as polyethylene terephthalate, andpolyolefins such as polypropylene and polyethylene are preferablyexemplified. The thickness of the base material is in the range ofpreferably 5 to 50 μm. When the thickness of the base material is 5 μmor more, the strength of the support can be advantageously obtainedwhile when the thickness of the film is 50 μm or less, the gap betweenthe mask and the pattern upon patterning becomes small so that finerpatterns can be advantageously formed. From the above-mentionedviewpoints, the thickness of the base material is in the range of morepreferably 10 to 40 μm, further more preferably 15 to 30 μm, andparticularly preferably 20 to 30 μm.

Further, to increase transmittance of light for exposure and reduceroughening of the side wall of the core pattern, it is preferable to usea flexible base material of high transparency type. A haze value of thebase material of high transparency type is preferably 5% or less, morepreferably 3% or less, and particularly preferably 2% or less. Note thatthe haze values can be measured according to JIS K7105 using, forexample, a commercially available turbidity meter such as NDH-1001DP(manufactured by Nippon Denshoku Industries Co., Ltd.). Such a basematerial is available as “Cosmo Shine A1517” and “Cosmo Shine A4100”(trade names, manufactured by Toyobo Co., Ltd.).

The film for forming optical waveguides provided on the thus-obtainedbase material can be readily stored by winding in the form of, forexample, a roll. Further, a protective film can be provided on the filmfor forming optical waveguides as necessary. Note that the base materialand protective film may be subjected to antistatic treatment or the likefor facilitating release of the film for forming optical waveguides in alater stage.

The resin film for forming optical waveguides of the present inventioncan be used as a lower cladding, a core, and an upper cladding of anoptical waveguide and is preferably used in at least one of these.

Hereinafter, the production method of forming optical waveguides usingthe resin film will be described in detail. The method includes, forexample, a method in which a lower cladding film released from the basematerial is removed of a protective film, if any, and is pressure-bondedto a substrate with heating to laminate it. Here, from the viewpoint ofadhesion and followability, it is preferable that the lamination isperformed under reduced pressure. The heating temperature for the resinfilm is preferably 50 to 130° C. The pressure at which pressure bondingis performed is on the order of preferably 0.1 to 1.0 MPa (on the orderof 1 to 10 kgf/cm²). However, these conditions are not particularlylimited. Then, the lower cladding film is cured by light or heat. A corefilm having a higher refractive index than that of the lower claddingfilm is laminated in a similar manner. The laminated resin film thusobtained is irradiated with actinic radiation through a negative orpositive mask pattern called artwork so that the actinic radiation formsan image. The light source for actinic radiation includes known lightsources that can effectively radiate ultraviolet ray, for example, acarbon arc lamp, a mercury vapor arc lamp, a super-high pressure mercurylamp, a high-pressure mercury lamp, and a Xenon lamp. Besides, thoselight sources that effectively radiate visible light such as a floodlamp for photography and a sunlight lamp can also be used.

Then, after exposure to light, wet development, dry development, or thelike is performed to remove unexposed portions to produce a corepattern. In the case of wet development, a developer that has acomposition corresponding to that of the above-mentioned resin film,such as an organic solvent, an alkaline aqueous solution, or awater-based developer is used to perform development by a known method,for example, by spraying, shaking immersion, brushing, scrubbing or thelike.

As the developer, organic solvents, alkaline aqueous solutions, and thelike that are safe and stable and user-friendly ones are preferablyused. The above-mentioned organic solvent-based developers include, forexample, 1,1,1-trichloroethane, N-methylpyrrolidone,N,N-dimethylformamide, N,N-dimethylacetamide, cyclohexanone, methylisobutyl ketone, and γ-butyrolactone. The organic solvents may containwater in a range of 1 to 20 mass % to prevent catching fire.

The bases that can be used for the above-mentioned alkaline aqueoussolution include, for example: alkali hydroxides such as hydroxides oflithium, sodium, or potassium; alkali carbonates such as carbonates orbicarbonates of lithium, sodium, potassium, or ammonium; alkali metalphosphates such as potassium phosphate, and sodium phosphate; and alkalimetal pyrophosphates such as sodium pyrophosphate and potassiumpyrophosphate. Examples of a preferable alkaline aqueous solution usedfor development include a dilute solution of 0.1 to 5 mass % sodiumcarbonate, a dilute solution of 0.1 to 5 mass % potassium carbonate, adilute solution of 0.1 to 5 mass % sodium hydroxide, and a dilutesolution of 0.1 to 5 mass % sodium tetraborate. Further, it ispreferable that the alkaline aqueous solutions for development have a pHin the range of 9 to 11. The temperature of the alkaline aqueoussolution is adjusted depending on the developability of the layer of thephotosensitive resin composition. The alkaline aqueous solutions maycontain surfactants, defoaming agents, a small amount of organic solventfor promoting development, and the like.

The above-mentioned aqueous developer includes water, or an alkalineaqueous solution and at least one organic solvent. The alkalinesubstances besides the above-mentioned substances include, for example,borax, sodium metasilicate, tetramethylammonium hydroxide, ethanolamine,ethylenediamine, diethylenetriamine,2-amino-2-hydroxymethyl-1,3-propanediol, 1,3-diaminopropanol-2, andmorpholine. The pH of the developer is as low as possible within therange where development of resist can be carried out sufficiently, andis preferably pH 8 to 12, more preferably pH9 to 10. Example of theabove-mentioned organic solvent include triacetone alcohol, acetone,ethyl acetate, alkoxyethanol having an alkoxy group containing 1 to 4carbon atoms, ethyl alcohol, isopropyl alcohol, butyl alcohol,diethylene glycol monomethyl ether, diethylene glycol monoethyl ether,and diethylene glycol monobutyl ether. These can be used singly or twoor more of them can be used in combination. Preferably, theconcentration of the organic solvents is usually 2 to 90 mass % and thetemperature of the organic solvent can be adjusted depending on thedevelopability. Further, the aqueous developer may contain surfactants,defoaming agents, and so on in small amounts.

Further, two or more developing methods may be used in combination asnecessary. The methods for development include, for example, a dippingmethod, a battle method, a spray method such as a high pressure spraymethod, brushing, and slapping.

As a treatment after the development, heating at about 60 to about 250°C. or exposure to light of about 0.1 to about 1,000 ml/cm² may beperformed as necessary to further cure the core pattern.

Then, an upper cladding film having a refractive index lower than thatof the core film is laminated in the same manner as mentioned above tofabricate an optical waveguide.

Then, the flexible optical waveguide of the present invention isdescribed. The flexible optical waveguide of the present invention isfabricated by using a resin film for forming a core layer having a highrefractive index, two resin films for forming cladding layers having alow refractive index. The flexible optical waveguide of the presentinvention is characterized in that at least one of the resin films forforming cladding layers is constituted by a resin for forming a claddinglayer and a base material film and the base material film is arrangedoutside the cladding layer with respect to the core layer. With thisconstruction, a flexible optical waveguide to which flexibility andtoughness of the base material film are imparted can be obtained. Also,use of film-shaped materials for forming optical waveguides enables tosolve the problem of productivity and large area responsiveness specificto liquid materials. Further, the construction in which a base materialfilm is arranged outside the cladding layer avoids exposure of thecladding layer to external environment, so the optical waveguide becomesless influenced by contamination or flaws to increase handleability.

While it is only necessary that the base material film arranged outsidethe cladding layer is provided on at least one side of the flexibleoptical waveguide, a flexible optical waveguide having less curling canbe fabricated by adopting a symmetric structure in which the basicmaterial film is provided on both sides of the optical waveguide.

The base material film for use in the resin film for forming a claddinglayer used here is a support that imparts flexibility and toughness tothe optical waveguide and its material is not particularly limited. Fromthe viewpoint of flexibility and toughness, preferable examples of thematerial for the base material film include polyesters such aspolyethylene terephthalate, polybutylene terephthalate, and polyethylenenaphthalate, polyethylene, polypropylene, polyamide, polycarbonate,polyphenylene ether, polyether sulfide, polyallylate, liquid crystalpolymer, polysulfone, polyether sulfone, polyether ether ketone,polyether imide, polyamideimide, and polyimide. The thickness of thebase material film may vary depending on the desired flexibility asappropriate. Preferably, the thickness of the base material film is 5 μmto 250 μm. The thickness of 5 μm or more is advantageous in thattoughness of the base material film can be easily obtained while thethickness of 250 μm or less provides sufficient flexibility.

Further, electric wiring may be provided on the base material film. Inthis case, a film having provided thereon an electric wiring in advancemay be used as a base material film. Alternatively, after a flexibleoptical waveguide is produced, an electric wiring can be formed on thebase material film thereof.

The resin film for forming the cladding layer preferably is preparedsuch that a film of the resin for forming a cladding layer is formed ona base material film that is subjected to adhesion treatment. Thisenhances the adhesion between the cladding layer and the base materialfilm to prevent failure in peeling off. The “adhesion treatment” as usedherein refers to a treatment for increasing adhesion force between thebase material film and the cladding layer resin formed thereon byadhesion promoting resin coating, corona treatment, matte processingsuch as sandblasting, or the like.

The resin for forming a cladding layer is not limited particularly asfar as it is a resin composition that has a lower refractive index thanthat of the core layer and is cured by light or heat. Thermosettingresin compositions and photosensitive resin compositions may be used.

More preferably, the resin for forming a cladding layer is constitutedby a resin composition that includes (A) a base polymer, (B) aphotopolymerizable compound, and (C) a photopolymerization initiator.Note that, the components (A), (B), and (C) are as described above.

The resin film for forming a cladding layer can be prepared withoutdifficulty by dissolving a resin composition containing the components(A) to (C) in a solvent, applying the resultant solution on the basematerial film, and removing the solvent. The solvent that can be used inthe present invention is the same as that used in preparing the resinfilm for an optical material. Note that the solid concentration in aresin solution is preferably on the order of preferably 30 to 80 mass %.

The thickness of the cladding layer after drying is in a range ofpreferably 5 μm to 500 μm. The thickness of 5 μm or more ensuressufficient thickness of cladding that is necessary for containment oflight and the thickness of 500 μm or less makes it easy to uniformlycontrol the film thickness. From the above-mentioned viewpoint, thethickness of the cladding layer is in a range of more preferably 10 μmto 100 μm.

Further, the thickness of the cladding layer is as follows. That is, thelower cladding layer that is formed first and the upper cladding layerthat is provided to embed the core pattern therein may have the samethickness or different thicknesses from one another. However, it ispreferable that the thickness of the upper cladding layer be made largerthan the thickness of the core layer in order to embed the core patternin the upper cladding layer.

The resin film for forming a core layer used in the present invention isdesigned so that the core layer has a higher refractive index than thatof the cladding layer, and a resin composition that can form a corepattern with actinic radiation can be used to prepare the resin film forforming a core layer. A photosensitive resin composition is suitable forthis purpose. Specifically, it is preferable that the same resincomposition as that used for forming the cladding layer be used. Thatis, a resin composition that contains the above-mentioned components(A), (B), and (C) and in addition the above-mentioned optionalcomponents as necessary is preferable.

The resin film for forming a core layer can be prepared withoutdifficulty by dissolving a resin composition containing the components(A) to (C) in a solvent, applying the resultant solution on the basematerial film, and removing the solvent. The solvent that can be usedhere is the same as that used in preparing the resin film for an opticalmaterial. The solid concentration in the resin solution is on the orderof preferably 30 to 80 mass %.

The thickness of the resin film for an optical material of the presentinvention is not particularly limited and the thickness after drying isusually 10 μm to 100 μm. When the thickness of the film is 10 μm ormore, the tolerance in alignment when connection is made to lightreceiving or emitting devices or optical fibers after the opticalwaveguide is formed can be advantageously expanded. On the other hand,when the thickness of the film is 100 μm or less, the connectioncoefficient with the light receiving or emitting devices or opticalfibers after can be advantageously increased. From the above-mentionedviewpoints, the thickness of the film is in the range of preferably 30μm to 70 μm.

The base material used in the manufacturing process of the resin filmfor forming a core layer is a support that supports the film for formingoptical waveguides and is not limited particularly on the material andmay be the same as those described above as the base material used inthe manufacturing process of the resin film for forming opticalwaveguides.

Hereinafter, the method of producing a flexible optical waveguideaccording to the present invention is explained in detail.

First, in a first step, a cladding layer is formed by curing a resin forforming a cladding layer in a resin film for forming a cladding layer,the resin film being constituted by the resin for forming a claddinglayer and a base material film. In the first step of forming a claddinglayer, in case where a protective film is provided on a side opposite tothe base material film in the resin film for forming a cladding layer,the resin film for forming a cladding layer is cured with light orheating after the protective layer is peeled off.

Then, in a second step, a resin film for forming a core layer islaminated on the cladding layer to laminate a core layer. In the secondstep, the resin film for forming a core layer is pressure bonded withheating on the above-mentioned cladding layer to laminate a core layerhaving refractive index larger than that of a cladding layer. Here, fromthe viewpoint of adhesion and followability, it is preferable that thelamination be performed under reduced pressure. The heating temperatureused here is preferably set to 50 to 130° C. and the pressure of thepressure bonding is preferably set to about 0.1 to about 1.0 MPa (1 to10 kgf/cm²). However, these conditions are not particularly limited. Theresin film for forming a core layer is easy to handle and thus ispreferable if it is constituted by a core layer and a base material andit may consist of a core layer alone.

Then, in a third step, the core layer is exposed to light and developedto form a core pattern of an optical waveguide. Specifically, actinicradiation is imagewise irradiated to the core layer through a negativemask pattern. The light source for actinic radiation includes knownlight sources that can effectively radiate ultraviolet ray, for example,a carbon arc lamp, mercury vapor arc lamp, a super-high pressure mercurylamp, a high-pressure mercury lamp, and a Xenon lamp. Besides, thoselight sources that effectively radiate visible light such as a floodlamp for photography and a sunlight lamp can also be used.

Then, in case where the base material of the resin film for forming acore layer remains, the base material is peeled off and then unexposedportions are removed by wet development or the like to effectdevelopment, thus forming a waveguide pattern. In the case of wetdevelopment, a developer that has a composition corresponding to that ofthe above-mentioned resin film, such as an organic solvent is used toperform development, for example, by spraying, shaking immersion,brushing, scrubbing or the like known method.

The organic solvent developer, developing method, and treatment afterdevelopment are the same as those mentioned above.

After that, a fourth step is performed, which includes laminating aresin film for forming a cladding layer for embedding therein a corepattern and curing the film. The lamination is performed such that incase the resin film for forming a cladding layer includes a resin forforming a cladding layer and a base material film, the resin for forminga cladding layer is arranged on the side of the core pattern. In thiscase, the thickness of the cladding layer is preferably made larger thanthat of the core layer. Curing is performed by light or heat in the samemanner as mentioned above.

The above-mentioned production method solves the conventional problemand greatly shortens the time of fabricating a multimode opticalwaveguide having a large core size.

The resin composition for an optical material that includes thecomponents (B) and (C) can be obtained by dissolving the components (B)and (C) in a solvent. The solvent used here is not particularly limitedas far as it can dissolve the resin composition. Examples of the solventinclude N-methylpyrrolidone, N,N-dimethylformamide,N,N-dimethylacetamide, cyclohexanone, methyl ethyl ketone, methylisobutyl ketone, γ-butyrolactone, methyl cellosolve, ethyl cellosolve,propylene glycol monomethyl ether, acetone, and toluene. Alternatively,mixed solvents thereof may be used. The resin concentration in the resinsolution is usually 30 to 80 mass %.

The resin composition for an optical material of the present inventionthat includes the components (B) and (C) is preferably used in at leastone of the lower cladding, core and upper cladding of an opticalwaveguide.

Hereinafter, the method of fabricating an optical waveguide using theresin composition for an optical material of the present invention thatincludes the components (B) and (C) is explained. The method involvesapplying the resin composition on a substrate using, for example, a spincoating method, a dipping method, a spraying method, a curtain-coatingmethod, a silk screen method, or a roll coating method, drying andremoving the solvent by heating or drying under reduced pressure, andthen curing the resin by irradiation of actinic radiation or by heating.The resin layer constitutes the cladding layer.

Then, by a similar coating method, a resin composition having arefractive index higher than that of the earlier formed opticalwaveguide layer is applied to form a core layer. Subsequently, actinicradiation is irradiated through a mask pattern of negative or positivetype. After the exposure to light, unexposed portions are removed by wetdevelopment, dry development or the like to perform development, wherebya core pattern is produced. Here, the optical waveguide pattern may befurther cured by heating it at about 60° C. to about 250° C. orperforming exposure at an intensity of about 0.1 to about 1,000 mJ/cm²before it can be used.

After that, a resin having a refractive index lower than that of thecore layer is applied to form a film in the same manner as mentionedabove to fabricate an optical waveguide.

EXAMPLE

Then, the present invention will be described in detail by examples.However, the present invention is by no means limited by the examples.

Example 1

Epoxyacrylate oligomer (trade name “HITALLOID”, manufactured by HitachiChemical Co., Ltd.) and phenoxy resin (trade name “YP-50”, manufacturedby Tohto Kasei Co., Ltd.) were blended in equivalent mass ratio (using50 mass parts per 100 mass parts of total resin of methyl ethyl ketoneas a solvent). To this was added a three-component optical radicalgenerator consisting of an optical initiator(2,2-bis(2-chlorophenyl)-4,4′,5,5′-tetraphenyl 1,2′-biimidazolemanufactured by Tokyo Chemical Industry Co., Ltd.;4,4′-bis(diethylamino) benzophenone manufactured by Tokyo ChemicalIndustry Co., Ltd., and 2-mercaptobenzimidazole manufactured by TokyoChemical Industry Co., Ltd.) in an amount of 2 mass parts based on 98mass parts of total resin to provide a resin composition for forming anoptical waveguide. This was applied on a PET film (“A4100”, manufacturedby Toyobo Co., Ltd.) using an applicator (“YBA-4”, manufactured byYoshimitsu Seiki Co., Ltd.) and dried under conditions of 80° C. for 10minutes and then 100° C. for 10 minutes to evaporate the solvent,thereby obtaining a resin film for optical waveguides. The thickness ofthe film could be adjusted between 5 μm and 100 μm by controlling thegap in the applicator. In this example, the thickness of the film wasadjusted to 12 μm.

The resin film for forming optical waveguides was laminated on a siliconwafer (thickness 1 μm) with a thermal oxidation film (thickness 1 μm)using a vacuum pressure laminator (MVLP-500, manufactured by Meiki Co.,Ltd.) under conditions of a pressure of 0.4 MPa and a temperature of 60°C. To this was irradiated ultraviolet ray at an intensity of 1 J/cm²from a metal halide lamp (“Eye Dolphin 3000”, manufactured by EyeGraphics Co., Ltd.) to optically cure the resin. After the PET film waspeeled off, the resin was postbaked under conditions of 160° C. for 1hour, thereby obtaining a slab optical waveguide (core thickness 12 μm).The refractive index of the obtained optical waveguide (core) wasmeasured using a prism coupler (Model 2020) manufactured by MetriconCorporation (measuring wavelength 830 nm). The refractive index obtainedwas 1.583 for both TE polarized light and TM polarized light. The slaboptical wave guide was passed through a solder reflow oven(“Salamander”, manufactured by Furukawa Electric Co., Ltd.) three timesunder conditions of maximum temperature of 265° C. (retention time of 15to 20 seconds at 260° C. or more) and nitrogen atmosphere.

Transmission losses before and after reflow were measured using a prismcoupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.60). As a result, the transmission lossesbefore and after reflow were found to be 0.2 dB/cm and 0.3 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss. Note that in thepresent example, the thermal oxidation film served as a lower claddingand air served as an upper cladding.

Further, the gap of the applicator was changed and a 50 μm-thick resinfilm for forming optical waveguides was prepared in the same manner asdescribed above. The film was exposed to light through a mask patternand developed with N,N-dimethylacetamide (room temperature, 40 seconds,vibration shaking) to form a pattern. As a result, fabrication of anoptical waveguide having a line width of 50 μm was confirmed.

Example 2

A resin film for forming optical waveguides was obtained in the samemanner as that in Example 1 except that solid epoxy resin (trade name“Epototo YD-7020”, manufactured by Tohto Kasei Co., Ltd.) was used inplace of the phenoxy resin. The thickness of the film was 12 μm.

The resin film for forming optical waveguides was treated in the samemanner as in Example 1 to obtain a slab optical waveguide (corethickness 12 μm). The refractive index of the slab optical waveguide(core) was measured in the same manner as in Example 1. As a result, therefractive index was 1.565 for both TE polarized light and TM polarizedlight. This was passed through a solder reflow oven (“Salamander”,manufactured by Furukawa Electric Co., Ltd.) three times underconditions of a maximum temperature of 265° C. (retention time of 15 to20 seconds at 260° C. or more) and nitrogen atmosphere.

Transmission losses before and after reflow were measured using a prismcoupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.60). As a result, the transmission lossesbefore and after reflow were found to be 0.2 dB/cm and 0.3 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Further, the gap of the applicator was changed and a 50 μm-thick resinfilm for forming optical waveguides was prepared in the same manner asabove. The film was exposed to light through a mask pattern anddeveloped with N,N-dimethylacetamide (room temperature, 40 seconds,vibration shaking) to form a pattern. As a result, fabrication of anoptical waveguide having a line width of 50 μm was confirmed.

Example 3

A resin film for forming optical waveguides was obtained in the samemanner as that in Example 1 except that acryl acrylate oligomer (tradename “HITALLOID 7975”, manufactured by Hitachi Chemical Co., Ltd.) wasused in place of epoxyacrylate oligomer, and acrylic resin (trade name“HTR-860P-3DR”, manufactured by Teikoku Chemical Industries Co., Ltd.)was used in place of phenoxy resin. The thickness of the film was 12 μm.

The resin film for forming optical waveguides was treated in the samemanner as in Example 1 to obtain a slab optical waveguide (corethickness 12 μm). The refractive index of the slab optical waveguide(core) was measured in the same manner as in Example 1. As a result, therefractive index was 1.505 for both TE polarized light and TM polarizedlight. This was passed through a solder reflow oven (“Salamander”,manufactured by Furukawa Electric Co., Ltd.) three times underconditions of a maximum temperature of 265° C. (retention time of 15 to20 seconds at 260° C. or more) and nitrogen atmosphere.

Transmission losses before and after reflow were measured using a prismcoupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.56). As a result, the transmission lossesbefore and after reflow were found to be 0.2 dB/cm and 0.3 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Further, the gap of the applicator was changed and a 50 μm-thick resinfilm for forming optical waveguides was prepared in the same manner asabove. The film was exposed to light through a mask pattern anddeveloped with N,N-dimethylacetamide (room temperature, 40 seconds,vibration shaking) to form a pattern. As a result, fabrication of anoptical waveguide having a line width of 50 μm was confirmed.

Example 4

Epoxy resin having two or more epoxy groups in the molecule (trade name“KRM-2110”, manufactured by Adeka Corporation) and a phenoxy resin(trade name “YP-50”, manufactured by Tohto Kasei Co., Ltd., 35% methylethyl ketone solution) were blended in amounts of 70.4 mass % and 29.6mass %, respectively and then the mixture was blended with aphotopolymerization initiator (trade name “SP-170”, manufactured byAdeka Corporation) in an amount of 2 mass parts per 100 mass parts ofthe resin components to provide a resin composition for forming opticalwaveguides. The resultant was applied on a polyester film (trade name“A4100”, manufactured by Toyobo Co., Ltd.) using an applicator (“YBA-4”,manufactured by Yoshimitsu Seiki Co., Ltd.) and dried under conditionsof 80° C. for 10 minutes and then 100° C. for 10 minutes to evaporatethe solvent, thereby obtaining a resin film for optical waveguides. Thethickness of the film on this occasion could be adjusted between 5 μmand 100 μm by controlling the gap in the applicator. In this example,the thickness of the film was adjusted to 12 μm.

The resin film for forming optical waveguides was laminated on a siliconwafer (thickness 1 μm) with a thermal oxidation film (thickness 1 μm)using a vacuum pressure laminator (MVLP-500, manufactured by Meiki Co.,Ltd.) under conditions of a pressure of 0.4 MPa and a temperature of 60°C. The resultant was irradiated with ultraviolet ray at an intensity of1 J/cm² by means of “EXM-7172-B-00” (manufactured by ORC manufacturingCo., Ltd.) to optically cure the resin. Then, the resin was postbakedunder conditions of 160° C. for 1 hour to obtain a slab opticalwaveguide (core thickness 12 μm). The refractive index of the obtainedoptical waveguide (core) was measured in the same manner as inExample 1. As a result, the refractive index obtained was 1.537 for bothTE polarized light and TM polarized light. The slab optical waveguidewas passed through a solder reflow oven (“Salamander”, manufactured byFurukawa Electric Co., Ltd.) three times under conditions of maximumtemperature of 265° C. (retention time of 15 to 20 seconds at 260° C. ormore) and nitrogen atmosphere.

Optical transmission losses before and after reflow were measured usinga prism coupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.56). As a result, the optical transmissionlosses before and after reflow were found to be 0.1 dB/cm. Thisindicates that the resin film for forming optical waveguides had highheat resistance and low loss. Note that in the present example, thethermal oxidation film served as a lower cladding and air served as anupper cladding.

Further, the gap of the applicator was changed and a 50 μm-thick resinfilm for forming optical waveguides was prepared in the same manner asabove. The film was exposed to light through a mask pattern anddeveloped with N,N-dimethylformamide (room temperature, 40 seconds,vibration shaking) to form a pattern. As a result, fabrication of anoptical waveguide having a line width of 50 μm was confirmed. Theresults are shown in Table 1.

Example 5

A resin film for forming optical waveguides was obtained in the samemanner as that in Example 1 except that the epoxy resin having two ormore epoxy groups in the molecule was replaced by “KRM-2199” trade name,manufactured by Adeka Corporation, and evaluated similarly. Note thatthe refractive index of the slab optical waveguide (core) was measuredin the same manner as in Example 1, the refractive index was 1.529 forboth TE polarized light and TM polarized light.

Optical transmission losses before and after reflow were measured usinga prism coupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.56) As a result, the optical transmissionlosses before and after reflow were found to be 0.1 dB/cm and 0.3 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Further, in the same manner as in Example 4, it was confirmed that anoptical waveguide having a line width of 50 μm could be fabricated. Theresults are shown in Table 1.

Example 6

A resin film for forming optical waveguides was obtained in the samemanner as that in Example 4 except that the epoxy resin having two ormore epoxy groups in the molecule was replaced by “KRM-2408” trade name,manufactured by Adeka Corporation, and evaluated similarly. Note thatthe refractive index of the slab optical waveguide (core) was measuredin the same manner as in Example 1, the refractive index was 1.532 forboth TE polarized light and TM polarized light.

Optical transmission losses before and after reflow were measured usinga prism coupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.56). As a result, the optical transmissionlosses before and after reflow were found to be 0.1 dB/cm and 0.2 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Further, in the same manner as in Example 4, it was confirmed that anoptical waveguide having a line width of 50 μm could be fabricated. Theresults are shown in Table 1.

Example 7

A resin film for forming optical waveguides was obtained in the samemanner as that in Example 4 except that the base polymer was replaced by“YD-7020” trade name, manufactured by Tohto Kasei Co., Ltd. (solid epoxyresin at room temperature), and evaluated similarly. Note that therefractive index of the slab optical waveguide (core) was measured inthe same manner as in Example 1, the refractive index was 1.573 for bothTE polarized light and TM polarized light.

Optical transmission losses before and after reflow were measured usinga prism coupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.60) As a result, the optical transmissionlosses before and after reflow were found to be 0.2 dB/cm and 0.3 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Further, in the same manner as in Example 4, it was confirmed that anoptical waveguide having a line width of 50 μm could be fabricated. Theresults are shown in Table 1.

Comparative Example 1 to 3

Preparation of Resin Films for Forming Optical Waveguides in the samemanner as in Examples 4 to 6, respectively, was attempted except that abase polymer not used in Examples 4 to 6. In each case, after thesolvent was evaporated, no films could be formed from the resins andremained liquid. The results obtained are shown in Table 1.

TABLE 1 Table 1 Optical transmission (B) (C) loss (dB/cm) (A) BasePhotopolymerizable Polymerization Film Before After polymer Compoundinitiator formability reflow reflow Example 4 YP-50 KRM-2110 SP-170Possible 0.1 0.1 (29.6 mass %) (70.4 mass %) (2 Mass part) Example 5YP-50 KRM-2199 SP-170 Possible 0.1 0.3 (29.6 mass %) (70.4 mass %) (2Mass part) Example 6 YP-50 KRM-2408 SP-170 Possible 0.1 0.2 (29.6 mass%) (70.4 mass %) (2 Mass part) Example 7 YP-7020 KRM-2110 SP-170Possible 0.2 0.3 (29.6 mass %) (70.4 mass %) (2 Mass part) ComparativeNone KRM-2110 SP-170 Impossible — — example 1 (100 Mass part) (2 Masspart) Comparative None KRM-2199 SP-170 Impossible — — example 2 (100Mass part) (2 Mass part) Comparative None KRM-2408 SP-170 Impossible — —example 3 (100 Mass part) (2 Mass part)

Example 8

Using the composition shown in Table 2, resins for a core and acladding, respectively, were provided. Methyl ethyl ketone as a solventwas added in an amount of 40 mass parts based on the total amount toprepare resin varnishes for a core and a cladding, respectively. Thosewere applied on a PET film (“A4100”, manufactured by Toyobo Co., Ltd.)using an applicator (“YBA-4”, manufactured by Yoshimitsu Seiki Co.,Ltd.) and dried under conditions of 80° C. for 10 minutes and then 100°C. for 10 minutes to evaporate the solvent, thereby obtaining a resinfilm for optical waveguides. The thickness of the film could be adjustedbetween 5 μm and 100 μm by controlling the gap in the applicator. Inthis example, the thicknesses of the films after the curing wereadjusted such that the core film was 50 μm thick, the lower cladding was30 μm thick, and the upper cladding was 80 μm thick. Note that therefractive indices of the core film and cladding film were measured inthe same manner as in Example 1 (measuring wavelength: 830 nm) to findthat the core film had a refractive index of 1.586 and the cladding filmhad a refractive index of 1.537.

The lower cladding film was laminated on an FR-4 substrate (trade name“E-679F”, manufactured by Hitachi Chemical Co., Ltd.) using a vacuumpressure laminator (MVLP-500, manufactured by Meiki Co., Ltd.) underconditions of a pressure of 0.5 MPa and a temperature of 50° C. for apressurization time of 30 seconds. Then, to this was irradiatedultraviolet ray (wavelength 365 nm) at an intensity of 1000 mJ/cm² by anultraviolet exposure device (“EXM-1172”, manufactured by ORCmanufacturing Co., Ltd.) to form a lower cladding (FIG. 1( a)). Then, onthe lower cladding, a core film was laminated using the above-mentionedvacuum pressure laminator under conditions of a pressure of 0.5 MPa anda temperature of 50° C. for a pressurization time of 30 seconds (FIG. 1(b)). Subsequently, ultraviolet ray (wavelength 365 nm) was irradiated atan intensity of 1000 mJ/cm2 through a photo mask using theabove-mentioned ultraviolet exposure device (FIG. 1( c)). Thereafter,the core pattern was developed using N,N-dimethylacetamide as a solvent(FIG. 1( d)). To clean the developer, methanol and water were used.

Then, an upper cladding was formed in the same conditions as those forforming the lower cladding. Finally, heat treatment was performed at160° C. to fabricate an optical waveguide (FIG. 1( e)).

The transmission loss of the optical waveguide thus obtained weremeasured using a 855-nm LED (“Q81201”, manufactured by AdvantestCorporation) as a light source and a light receiving sensor (“Q82214”,manufactured by Advantest Corporation) by a cut-back method (measuredwaveguide wavelength 5, 3, and 2 cm, input fiber; GI-50/125 multimodefiber (NA=0.20), output fiber; SI-114/125 (NA=0.22), input light;effective core diameter 26 μm) to find 0.3 dB/cm. Further, thefabricated optical waveguide were passed through a solder reflow oven(“Salamander”, manufactured by Furukawa Electric Co., Ltd.) three timesunder conditions of a maximum temperature of 265° C. (retention time of15 to 20 seconds at 260° C. or more) and nitrogen atmosphere, and lossdegradation by reflow was measured. As a result, no increase in loss byreflow was observed. This indicated that the optical waveguidefabricated using the resin film for forming optical waveguides of thepresent invention had high heat resistance and low loss.

Further, checking the pattern formability of the resin film confirmedthat fine patterns with line/space of 30/95 μm, 40/85 μm, and 50/75 μmcould be formed (Table 3).

TABLE 2 (B) Photopolymerizable (A) Base polymer compound (C)Polymerization initiator For core Phenototo YP-70*¹ A-BPEF*²2,2-Bis(2-chlorophenyl)-4,4′,5,5′- (20.4 mass %) (39.8 mass %)tetraphenyl 1,2′-biimidazole*⁵ (1 mass part) EA-1020*³4,4′-Bis(diethylamino)benzophenone*⁶ (39.8 mass %) (0.5 mass parts)2-Mercaptobenzimidazole*⁷ (0.5 mass parts) For Phenototo YP-70*¹KRM-2110*⁴ SP-170*⁸ cladding (35.7 mass %) (64.3 mass %) (2 mass parts)*¹Phenototo YP-70; Phenoxy resin (manufactured by Tohto Kasei Co.,Ltd.), bisphenol A/bisphenol F copolymer type phenoxy resin *²A-BPEF;fluorene diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.),9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene *³EA-1020; bisphenol Atype epoxyacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.),bisphenol A type epoxyacrylate *⁴KRM-2110; 2-functional alicyclic epoxyresin (manufactured by Adeka Corporation), alicyclic diepoxy carboxylate*⁵2,2-bis(2-chlorophenyl)-4,4′,5,5′-tetraphenyl-1,2′-biimidazole;manufactured by Tokyo Chemical Industry Co., Ltd.*⁶4,4′-Bis(diethylamino)benzophenone; manufactured by Tokyo ChemicalIndustry Co., Ltd. *⁷2-Mercaptobenzimidazole; manufactured by TokyoChemical Industry Co., Ltd. *⁸SP-170; triphenylsulfoniumhexafluoroantimonate

Example 9

A flexible optical waveguide was fabricated in the same manner as thatin Example 8 except that for the photopolymerization initiator (C) forcore in Table 2, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (1mass part, manufactured by Ciba Specialty Chemicals) was replaced by1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one (1 masspart, manufactured by Chiba Specialty Chemicals), and the irradiationdose of ultraviolet ray upon exposure of the core pattern was changed to400 mJ/cm². Note that in this case, the refractive index of the corelayer measured using a prism coupler (Model 2020) manufactured byMetricon Corporation was 1.582.

The transmission loss of the optical waveguide thus obtained wasmeasured by the cut-back method in the same manner as in Example 8(measured waveguide wavelength 5, 3, and 2 cm, input fiber; GI-50/125multimode fiber (NA=0.20), output fiber; SI-114/125 (NA=0.22), inputlight; effective core diameter 26 μm) was 0.1 dB/cm. This indicated thatwhen the initiator in this example was used, the obtained opticalwaveguide had a very high transparency. Further, loss deterioration dueto reflow was measured in the same manner as in Example 8, which gave anincrease in loss of below 0.1 dB/cm, confirming that the fabricatedoptical waveguide had high heat resistance.

Reference Example 1

A flexible optical waveguide was fabricated in the same manner as thatin Example 8 except that Phenototo YP-70 was replaced by Phenototo YP-50(bisphenol A type epoxy resin, manufactured by Tohto Kasei Co., Ltd.).The transmission loss of the flexible optical waveguide was 0.3 dB/cmand no increase in loss due to reflow was observed. However, patterns ata line/space of 30 μm/95 μm, and 50 μm/75 μm could not be formed (Table3). The pattern at a line/space of 30 μm/95 μm showed peeling of coredue to insufficient cladding/core interface adhesion while the patternat a line/space of 50 μm/75 μm showed development residue due to lowsolubility of unexposed portions.

TABLE 3 Table 3 Transmission loss (dB/cm) Before After Patternformability (line/space) reflow reflow 30/95 (μm) 40/85 (μm) 50/75 (μm)Example 8 0.3 0.3 Possible Possible Possible Reference 0.3 0.3Impossible Possible Impossible example 1

Example 10

To fluorene diacrylate (trade name “A-BPEF”, manufactured byShin-Nakamura Chemical Co., Ltd.) was added 2 mass % of aphotopolymerization initiator (a three-component optical radicalgenerator consisting of “2,2-bis(2-chlorophenyl)-4,4′,5,5′-tetraphenyl1,2′-biimidazole” manufactured by Tokyo Chemical Industry Co., Ltd.);“4,41-bis(diethylamino)benzophenone” manufactured by Tokyo ChemicalIndustry Co., Ltd., and “2-mercaptobenzimidazole” manufactured by TokyoChemical Industry Co., Ltd.) and N,N-dimethylacetamide as a solvent inan amount of 30 mass parts per total 100 mass parts of fluorenediacrylate and the optical initiator to provide a resin composition forforming optical waveguides. Then, a resin layer was formed on a siliconwafer (thickness 1 μm) with a thermal oxidation film (thickness 1 μm) bya spin coating method and dried under conditions of 80° C. for 10minutes and then 100° C. for 10 minutes to evaporate and remove thesolvent. Subsequently, the resultant resin layer was irradiated withultraviolet ray at an intensity of 1 J/cm² from a high-pressure mercurylamp to optically cure the resin. Further, the resin was postbaked underconditions of 160° C. for 1 hour to obtain a slab optical waveguide(core thickness 10 μm). The refractive index of the obtained slaboptical waveguide (core) was measured in the same manner as in Example1, thereby observing a refractive index of 1.613 for both TE polarizedlight and TM polarized light. Further, measurement of the slab opticalwaveguide using TGD-7000, manufactured by ULVAC indicated that the slaboptical waveguide had a thermal decomposition temperature of about 300°C., confirming that it had high heat resistance.

The slab optical waveguide was passed through a solder reflow oven(“Salamander”, manufactured by Furukawa Electric Co., Ltd.) three timesunder conditions of maximum temperature of 265° C. (retention time of 15to 20 seconds at 260° C. or more) and nitrogen atmosphere. Transmissionlosses before and after reflow were measured using a prism coupleroptical characteristics measuring apparatus (SPA-4000, manufactured bySAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm, using matchingoil of nD=1.62). As a result, the transmission losses before and afterreflow were found to be 0.1 dB/cm and 0.1 dB/cm, respectively. Thisindicates that the resin film for forming optical waveguides had highheat resistance and low loss. Note that in the present example, thethermal oxidation film served as a lower cladding and air served as anupper cladding.

Example 11

To fluorene diacrylate (trade name “A-BPEF”, manufactured byShin-Nakamura Chemical Co., Ltd.) was added as a base polymer, a phenoxyresin (trade name “Phenototo YP-50”, manufactured by Tohto Kasei Co.,Ltd.) such that fluorene diacrylate was in an amount of 80 mass % andthe phenoxy resin was in an amount of 20 mass %, as well as an opticalinitiator in an amount of 2 mass parts per total 100 mass parts of theresins (a three-component optical radical generator consisting of“2,2-bis(2-chlorophenyl)-4,4′,5,5′-tetraphenyl 1,2′-biimidazole”manufactured by Tokyo Chemical Industry Co., Ltd.);“4,4′-bis(diethylamino)benzophenone” manufactured by Tokyo ChemicalIndustry Co., Ltd., and “2-mercaptobenzimidazole” manufactured by TokyoChemical Industry Co., Ltd.). To the resultant was added 40 mass partsof methyl ethyl ketone as a solvent to provide a resin composition forforming optical waveguides. The resin composition was applied on a PETfilm (“A4100”, manufactured by Toyobo Co., Ltd.) using an applicator(“YBA-4”, manufactured by Yoshimitsu Seiki Co., Ltd.) and dried underconditions of 80° C. for 10 minutes and then 100° C. for 10 minutes toevaporate and remove the solvent, thereby obtaining a resin film foroptical waveguides. The thickness of the resin film for opticalwaveguides could be adjusted between 5 μm and 100 μm by controlling thegap in the applicator. In this example, the thickness of the resin filmwas adjusted to 12 μm.

The resin film for forming optical waveguides was laminated on a siliconwafer (thickness 1 μm) with a thermal oxidation film (thickness 1 μm)using a vacuum pressure laminator (MVLP-500, manufactured by Meiki Co.,Ltd.) under conditions of a pressure of 0.4 MPa and a temperature of 60°C. To this was irradiated ultraviolet ray at an intensity of 1 J/cm² byan ultraviolet exposure device (“EXM-7172”, manufactured by ORCmanufacturing Co., Ltd.) to optically cure the resin and then postbaking was performed under conditions of at 160° C. for 1 hour to obtaina slab optical waveguide (core thickness 12 μm). The refractive index ofthe obtained slab optical waveguide (core) was measured in the samemanner as in Example 1, thereby obtaining a refractive index of 1.607for both TE polarized light and TM polarized light. The slab opticalwaveguide was passed through a solder reflow oven (“Salamander”,manufactured by Furukawa Electric Co., Ltd.) three times underconditions of maximum temperature of 265° C. (retention time of 15 to 20seconds at 260° C. or more) and nitrogen atmosphere.

Transmission losses before and after reflow were measured using a prismcoupler optical characteristics measuring apparatus (SPA-4000,manufactured by SAIRON TECHNOLOGY, INC.) (measuring wavelength: 830 nm,using matching oil of nD=1.62). As a result, the transmission lossesbefore and after reflow were found to be 0.2 dB/cm and 0.2 dB/cm,respectively. This indicates that the resin film for forming opticalwaveguides had high heat resistance and low loss.

Example 12

A slab optical waveguides was obtained in the same manner as that inExample 11 except that solid epoxy resin at room temperature (trade name“Epototo YD-7020”, manufactured by Tohto Kasei Co., Ltd.) was used inplace of the phenoxy resin in Example 11. The refractive index of theslab optical waveguide (core) was measured in the same manner as inExample 1. As a result, the refractive index was 1.604 for both TEpolarized light and TM polarized light. This was passed through a solderreflow oven (“Salamander”, manufactured by Furukawa Electric Co., Ltd.)three times under conditions of a maximum temperature of 265° C.(retention time of 15 to 20 seconds at 260° C. or more) and nitrogenatmosphere. Transmission losses before and after reflow were measuredusing a prism coupler optical characteristics measuring apparatus(SPA-4000, manufactured by SAIRON TECHNOLOGY, INC.) (measuringwavelength: 830 nm, using matching oil of nD=1.62). As a result, thetransmission losses before and after reflow were found to be 0.2 dB/cmand 0.2 dB/cm, respectively. This indicates that the resin film forforming optical waveguides had high heat resistance and low loss.

Example 13

Using the composition shown in Table 2, resin compositions for a coreand a cladding, respectively, were provided. Ethyl cellosolve as asolvent was added in an amount of 40 mass parts based on the totalamount to prepare resin varnishes for a core and a cladding,respectively.

These were applied on a PET film (“Cosmo Shine A1517”, manufactured byToyobo Co., Ltd., thickness 16 μm) using an applicator (“YBA-4”,manufactured by Yoshimitsu Seiki Co., Ltd.) (resin film for forming acladding layer: a wound adhesive-treated surface was used, resin filmfor forming a core layer: a unwound non-treated surface was used) anddried under conditions of 80° C. for 10 minutes and then 100° C. for 10minutes to dry the solvent, thereby obtaining resin films for forming acore layer and cladding layer, respectively. The thickness of the filmcould be adjusted between 5 μm and 100 μm by controlling the gap in theapplicator. In this example, the thicknesses of the films after thecuring were adjusted such that the core film was 40 μm thick, the lowercladding was 20 μm thick, and the upper cladding was 70 μm thick.

To this was irradiated ultraviolet ray at an intensity of 1000 ml/cm² byan ultraviolet exposure device (“EXM-1172”, manufactured by ORCmanufacturing Co., Ltd.) to optically cure the resin (FIG. 2( a)). Then,a resin film for forming a core layer was laminated on the claddinglayer using a vacuum pressure laminator (MVLP-500, manufactured by MeikiCo., Ltd.) under conditions of a pressure of 0.4 MPa, a temperature of70° C., and a pressure time of 30 seconds (see, FIG. 2( b)).Subsequently, this was irradiated with ultraviolet ray at an intensityof 1000 mJ/cm² through a photo mask (negative type) of 40 μm in widthusing the above-mentioned ultraviolet exposure device (wavelength 365nm) (see, FIG. 2( c)), and then the core pattern was developed with amixed solvent consisting of 8:2 mixture of ethyl cellosolve andN,N-dimethylacetamide (see, FIG. 2( d)). To clean the developer,methanol and water were used. Then, a resin film for forming an uppercladding was laminated on the core pattern under similar laminationconditions, irradiated with ultraviolet ray, and heat-treated at 110° C.to fabricate a flexible optical waveguide (see, FIG. 2( e)).

Note that the refractive index of the core layer and the cladding layerwas measured using a prism coupler (Model 2010) manufactured by MetriconCorporation at a wavelength of 850 nm. The refractive index obtained was1.584 for the core layer and 1.537 for the cladding layer.

The transmission loss of the flexible optical waveguide was measuredusing a 855-nm LED (“Q81201”, manufactured by Advantest Corporation) asa light source by a cut-back method (measured waveguide wavelengths of5, 3, and 2 cm, input fiber; GI-50/125 multimode fiber (NA=0.20), outputfiber; SI-114/125 (NA=0.22), input light; effective core diameter 26μm), thereby observing 0.3 dB/cm.

Further, winding flexibility around a pole having radius of 2 mm andtoughness were examined. The results showed that neither cracks wereobserved in the optical waveguide nor interface separation between thecladding layer and the core layer occurred, thus indicating that theoptical waveguide had high flexibility and toughness.

Example 14

An optical waveguide was fabricated in the same manner as in Example 13except that the photopolymerization initiator (C) for core in Table 4was changed to bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (1 masspart, manufactured by Ciba Specialty Chemicals)1-[4-(2-hydroxyethoxy)phenyl] and -2-hydroxy-2-methyl-1-propan-1-one (1mass part, manufactured by Ciba Specialty Chemicals), and theirradiation dose of ultraviolet ray upon exposure of the core patternwas changed to 400 mJ/cm². The refractive index of the core layermeasured using a prism coupler (Model 2010) manufactured by MetriconCorporation was 1.582.

The transmission loss of the flexible optical waveguide thus obtainedmeasured in the same manner as in Example 13 was found to be 0.1 dB/cm,indicating that use of an initiator in this example provided very hightransparency.

Example 15

Using the composition shown in Table 4, resin compositions for a coreand a cladding, respectively, were provided. Ethyl cellosolve as asolvent was added in an amount of 40 mass parts based on the totalamount to prepare resin varnishes for a core layer and a cladding layer,respectively.

TABLE 4 (B) Photopolymerizable (A) Base polymer compound (C)Polymerization initiator Core Phenototo YP-70*¹ A-BPEF*²Bis(2,4,6-trimethylbenzoyl)phenylphosphine (20 mass parts) (39 massparts) oxide*⁹ (1 mass part) EA-1020*³ 1-[4-(2-Hydroxyethoxy)phenyl]-(39 mass parts) 2-hydroxy-2-methyl-1-propan-1- one*¹⁰ (1 mass part)Cladding Phenototo YP-70*¹ KRM-2110*⁴ SP-170*⁸(2 mass parts) (35 massparts) (62.5 mass parts) SP-100*¹¹ (0.5 mass parts) *1 to *4 and *8Above mentioned. *⁹Bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;manufactured by Ciba Specialty Chemicals*¹⁰1-[4-(2-Hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one;manufactured by Ciba Specialty Chemicals *¹¹SP-100; aromatic compound,manufactured by Adeka Corporation.

The varnish for forming a cladding layer was applied on acorona-discharge-treated surface of a polyamide film (trade name“Mictron”, manufactured by Toray Industries, Inc., 12 μm thick) and thevarnish for forming a core was applied on a non-treated surface of a PETfilm (trade name “Cosmo Shine A1517”, manufactured by Toyobo Co., Ltd.,16 μm thick) using an applicator (trade name “YBA-4”, manufactured byYoshimitsu Seiki Co., Ltd.) and the solvent was dried at 80° C. for 10minutes and then 100° C. for 10 minutes to obtain resin films forforming a core layer and a cladding layer. The thickness of the films onthis occasion could be adjusted between 5 μm and 100 μm by controllingthe gap in the applicator. In this example, the thickness of the filmsafter curing was adjusted to 40 μm for the core layer, 20 μm for thelower cladding layer, and 70 μm for the upper cladding layer.

To this was irradiated ultraviolet ray at an intensity of 1000 mJ/cm² byan ultraviolet exposure device (“EXM-1172”, manufactured by ORCmanufacturing Co., Ltd.) to optically cure the resin (FIG. 2( a)). Then,a resin film for forming a core layer was laminated on the claddinglayer using a vacuum pressure laminator (MVLP-500, manufactured by MeikiCo., Ltd.) under conditions of a pressure of 0.4 MPa, a temperature of70° C. and a pressure time of 30 seconds (see, FIG. 2( b)) Subsequently,this was irradiated with ultraviolet ray at an intensity of 400 mJ/cm²through a photo mask (negative type) of 40 μm in width using theabove-mentioned ultraviolet exposure device (see, FIG. 2( c)), and thenthe core pattern was developed with a mixed solvent consisting of 8:2mixture of ethyl cellosolve and N,N-dimethylacetamide (see, FIG. 2( d)).To clean the developer, methanol and water were used. Then, a resin filmfor forming an upper cladding was laminated on the core pattern undersimilar lamination conditions, irradiated with ultraviolet ray by using“Eyedolphin 3000” (manufactured by Eye graphics Co., Ltd.) (wavelength405 nm), and then heat-treated at 160° C. to fabricate a flexibleoptical waveguide (see, FIG. 2( e)).

Note that the refractive index of the obtained optical waveguide wasmeasured using a prism coupler (Model 2010) manufactured by MetriconCorporation at a wavelength of 850 nm. The refractive index obtained was1.582 for the core layer and 1.539 for the cladding layer.

The transmission loss of the flexible optical waveguide was measuredusing a 855-nm LED (“Q81201”, manufactured by Advantest Corporation) asa light source by a cut-back method (measured waveguide wavelengths of5, 3, 2 cm, input fiber; GI-50/125 multimode fiber (NA=0.20), outputfiber; SI-114/125 (NA=0.22), input light; effective core diameter 26μm), thereby observing 0.1 dB/cm and extremely low loss.

Further, the fabricated flexible optical waveguide was passed through asolder reflow oven (“Salamander”, manufactured by Furukawa Electric Co.,Ltd.) three times under conditions of a maximum temperature of 265° C.(retention time of 15 to 20 seconds at 260° C. or more) and nitrogenatmosphere, and an increase in loss by reflow was measured. As a result,an increase in loss by reflow was found to be below 0.1 dB/cm. Thisindicated that when polyamide was used as the base material film, theresultant flexible optical waveguide had high heat resistance.

Further, winding flexibility around a pole having radius of 2 mm andtoughness were examined. The results showed that neither cracks wereobserved in the optical waveguide nor interface separation between thecladding layer and the base material film or between the cladding layerand the core layer occurred, thus indicating that the optical waveguidehad high flexibility and toughness.

Example 16

A flexible optical waveguide was fabricated in the same manner as thatin Example 13 except that the resin film for forming a cladding wasapplied to the unwound (non-treated surface) of a PET film. In thiscase, when the obtained flexible optical waveguide was wound around apole having a radius of 2 mm, some peeling occurred on the interfacebetween the cladding layer and the base material film and cracksoccurred on the flexible optical waveguide. However, the flexibleoptical waveguide had sufficient flexibility and toughness for practicalpurposes.

Example 17

The core film and cladding film (both 10 μm thick) prepared in the samemanner as that in Example 8 were measured for refractive index andbirefringence using a prism coupler (Model 2020) manufactured byMetricon Corporation. The results obtained are shown in Table 5. Theobtained core film and cladding film had high refractive index at eachmeasuring wavelength while they showed no birefringence and thusrevealed to be excellent optical materials.

Further, the core film and cladding film (both 70 μm thick) prepared inthe same manner as that in Example 8 were measured for lighttransmissivity of resin films for optical materials (having the samecomposition as that of the core film in the example, 70 μm thick) usinga spectrophotometer (Model U-3410) manufactured by Hitachi Chemical Co.,Limited. As a result, both the films had 90% or more transmissivity inthe visible light range of 400 to 800 nm, demonstrating that they wereresin films for optical materials having excellent transparency.

TABLE 5 Refractive index Wavelength TE Polarized TM Polarized (nm) lightlight Birefringence Core film 633 1.594 1.594 0.000 830 1.586 1.5860.000 1300 1.577 1.577 0.000 1550 1.576 1.576 0.000 Cladding 633 1.5441.546 0.001 film 830 1.537 1.536 0.001 1300 1.530 1.530 0.000 1550 1.5291.529 0.000

Examples 18 to 27

The resin compositions of the above-mentioned examples described inTable 6 were applied to a silicon substrate to fabricate resin films foroptical materials having a thickness of 10 μm and their refractive indexand birefringence were measured (measuring wavelength 830 nm) using aprism-coupler (Model 2020) manufactured by Metricon Corporation).Further, they were measured for light transmissivity in the same manneras that in Example 17. The results obtained are shown in Table 6.

The resin films for optical materials in Example 18 to 24 showed nobirefringence and revealed to be excellent optical materials having hightransparency. Further, the resin films for optical materials in Examples25 to 27 were excellent optical materials, respectively, since they hadhigh refractive index while they had less birefringence, and still hadhigh transparency.

TABLE 6 Table 6 Refractive index TE TM Exam- Resin Polarized PolarizedBire- Trans- ple Composition light light fringence missivity 18 Example1 1.583 1.583 0.000 90% or more 19 Example 2 1.565 1.565 0.000 90% ormore 20 Example 3 1.506 1.506 0.000 90% or more 21 Example 4 1.537 1.5370.000 90% or more 22 Example 5 1.529 1.529 0.000 90% or more 23 Example6 1.532 1.532 0.000 90% or more 24 Example 7 1.573 1.573 0.000 90% ormore 25 Example 10 1.613 1.611 0.002 90% or more 26 Example 11 1.6071.604 0.001 90% or more 27 Example 12 1.604 1.603 0.001 90% or more

INDUSTRIAL APPLICABILITY

The resin composition for an optical material of the present inventionand the resin films for optical materials that includes the resincomposition of the present invention have excellent transparency andheat resistance and can be used as, for example, an optical waveguide, alens, an optical sealant, an optical adhesive, a light guide panel, or adiffractive grating. In particular, they can be advantageously used as aresin film for optical waveguide. In addition, they can be used as acoating material, a resist and so on. When they are used as a resin filmfor optical waveguides, it is possible to form a thick film having hightransparency, high heat resistance, and high precision. Therefore, byusing the film of the present invention in at least one of the lowercladding, core, and upper cladding, an optical waveguide havingexcellent performance can be obtained. Further, according to the presentinvention, a large-area film can be produced, so optical waveguides canbe produced with high productivity.

1. A resin composition for an optical material, comprising: (A) a basepolymer; (B) a photopolymerizable compound; and (C) aphotopolymerization initiator wherein the component (B) contains aphotopolymerizable compound which is selected from the group consistingof epoxy(meth)acrylate, acryl(meth)acrylate, fluorene di(meth)acrylaterepresented by the following general formula (I), (meth)acrylaterepresented by the following general formula (III) and a compound having2 or more epoxy groups in a molecule thereof:

wherein X is represented by the following formula (II): y is hydrogen ora methyl group; and m and n are each an integer of 1 to 20:

wherein R1 to R16 independently represent hydrogen, an alkyl grouphaving 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms,an alkoxycarbonyl group having 2 to 7 total carbon atoms, an aryl grouphaving 6 to 10 carbon atoms, or an aralkyl group having 7 to 9 carbonatoms;

wherein R¹⁷ is —CH₂CH(OH)CH₂—, —(C₂H₄O)_(h)C₂H₄—, —(C₃H₆O)_(i)C₃H₆—, or—(C₂H₄O)_(j)—(C₃H₆O)_(k)C₃H₆—; U is —C(CH₃)₂—, —CH₂—, —SO₂—, or —O—; Vis hydrogen or halogen; and W is hydrogen or —CH₃, provided that h, i,j, and k are each an integer of 0 to
 10. 2. A resin composition for anoptical material according to claim 1, wherein the photopolymerizablecompound (B) is epoxy(meth)acrylate or acryl(meth)acrylate.
 3. A resincomposition for an optical material according to claim 1, wherein thecomponent (B) contains fluorene di(meth)acrylate represented by thefollowing general formula (I):

wherein X is represented by the following formula (II); Y is hydrogen ora methyl group; and m and n are each an integer of 1 to 20;

wherein R1 to R16 independently represent hydrogen, an alkyl grouphaving 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms,an alkoxycarbonyl group having 2 to 7 total carbon atoms, an aryl grouphaving 6 to 10 carbon atoms, or an aralkyl group having 7 to 9 carbonatoms.
 4. A resin composition for an optical material according to claim1, wherein the component (B) contains (meth)acrylate represented by thefollowing general formula (III):

wherein R¹⁷ is —CH₂CH(OH)CH₂—, —(C₂H₄O)_(h)C₂H₄—, —(C₃H₆O)C₃H₆—, or—(C₂H₄O)_(j)—(C₃H₆O)_(k)C₃H₆—; U is —C(CH₃)₂, —CH₂—, —SO₂—, or —O—; V ishydrogen or halogen; and W is hydrogen or —CH₃, provided that h, i, j,and k are each an integer of 0 to
 10. 5. A resin composition for anoptical material according to claim 1, wherein the resin compositioncontains as the component (B) a compound having 2 or more epoxy groupsin a molecule thereof.
 6. A resin composition for an optical materialaccording to claim 1, wherein the base polymer (A) has a number averagemolecular weight of 5,000 or more.
 7. A resin composition for an opticalmaterial according to claim 1, wherein the base polymer (A) has anaromatic skeleton in a main chain thereof.
 8. A resin composition for anoptical material according to claim 7, wherein the base polymer (A)comprises as structural units of the copolymer components: (a-1) atleast one member selected from the group consisting of bisphenol A, abisphenol A type epoxy compound, and derivatives thereof; and (a-2) atleast one member selected from the group consisting of bisphenol F, abisphenol F type epoxy compound, and derivatives thereof.
 9. A resincomposition for an optical material according to claim 7, wherein thebase polymer (A) comprises a phenoxy resin.
 10. A resin composition foran optical material according to claim 1, wherein the base polymer (A)comprises an epoxy resin that is solid at room temperature.
 11. A resincomposition for an optical material according to claim 1, wherein: thecontent of the component (A) is 5 to 80 mass % and the content of thecomponent (B) is 20 to 95 mass % with respect to a total content of thecomponents (A) and (B); and the content of the component (C) is 0.1 to10 mass parts with respect to 100 mass parts of the components (A) and(B) in total.
 12. A resin composition for an optical material accordingto claim 11, wherein the content of the component (A) is 10 to 80 mass %and the content of the component (B) is 20 to 90 mass % with respect toa total content of the components (A) and (B).
 13. A resin compositionfor an optical material according to claim 1, wherein the content of thecomponent (B) is 90 to 99.9 mass % and the content of the component (C)is 0.1 to 10 mass % with respect to a total mass of the components (B)and (C).
 14. A resin film for an optical material, comprising the resincomposition according to claim
 1. 15. A resin film for an opticalmaterial according to claim 14, wherein the resin film for an opticalmaterial is a resin film for forming optical waveguides, and a curedproduct of the film has an optical transmission loss of 0.5 dB/cm orless.
 16. An optical waveguide, comprising the resin film for an opticalmaterial according to claim 15 as at least one of a lower cladding, acore, and an upper cladding of the optical waveguide.
 17. A flexibleoptical waveguide, comprising one resin film for forming a core layerand two resin films for forming a cladding layer, wherein at least oneof the resin films for forming a cladding layer is composed of a resinfor forming a cladding layer and a base material film, and the basematerial film is arranged on an outer side of the cladding layer withrespect to the core layer, and wherein at least one of the resin filmfor forming a core layer and the two resin films for forming a claddinglayer is the resin film for an optical material according to claim 15.18. A flexible optical waveguide according to claim 17, wherein theresin films for forming a cladding layer each comprise a base materialfilm subjected to adhesion treatment and a film of the resin for forminga cladding layer formed on the base material film.
 19. A method offabricating a flexible optical waveguide, comprising: a first step of curing a cladding layer in a resin film for forming a cladding layercomposed of the resin for forming a cladding layer and a base materialfilm to form a cladding layer; a second step of laminating a resin filmfor forming a core layer on the cladding layer to laminate a core layer;a third step of exposing the core layer to light to develop to form acore pattern of an optical waveguide; and a fourth step of laminating aresin film for forming a cladding layer on the core pattern and curingthe resin for forming a cladding layer, wherein at least one of theresin film for forming a core layer and the two resin films for forminga cladding layer is the resin film for an optical material according toclaim
 15. 20. A method of fabricating a flexible optical waveguideaccording to claim 19, wherein the resin film for forming a claddinglayer comprises a base material film subjected to adhesion treatment anda film of the resin for forming a cladding layer formed on the basematerial film.
 21. A method of fabricating an optical waveguide,comprising: a first step of laminating a resin film for an opticalmaterial on a substrate to form a lower cladding layer; a second step oflaminating a resin film for an optical material having a refractiveindex higher than that of the lower cladding layer on the lower claddinglayer to form a core layer; a third step of exposing the core layer tolight to develop the core layer to form a core pattern of an opticalwaveguide; and a fourth step of laminating a resin film for an opticalmaterial having a refractive index lower than that of the core layer toform an upper cladding layer, wherein at least one of the resin filmsfor optical materials used in the first step, the second step, and thefourth step is the resin film for an optical material according to claim14.
 22. A resin composition for an optical material, comprising: (B) aphotopolymerizable compound that is fluorene di(meth)acrylaterepresented by the following general formula (I); and (C) aphotopolymerization initiator,

wherein X is represented by the following formula (II); Y is hydrogen ora methyl group; and m and n are each an integer of 1 to 20;

wherein R1 to R16 independently represent hydrogen, an alkyl grouphaving 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms,an alkoxycarbonyl group having 2 to 7 total carbon atoms, an aryl grouphaving 6 to 10 carbon atoms, or an aralkyl group having 7 to 9 carbonatoms.
 23. A resin composition for an optical material according toclaim 22, wherein the content of the component (B) is 90 to 99.9 mass %and the content of the component (C) is 0.1 to 10 mass % with respect toa total mass of the components (B) and (C).